Slit Cleaning Nozzle for Uniform Gas-Liquid Substrate Cleaning
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing substrate cleaning processes face issues with non-uniform mixing of gas and liquid, leading to shadowing and reduced cleaning efficiency due to circular spray patterns, which affect the cleaning deviation and efficiency.
Innovation Solution
A substrate processing apparatus with a cleaning nozzle that sprays a mixed fluid in a slit shape, utilizing a slit-shaped discharge port to uniformly mix gas and liquid, minimizing liquid flow along the nozzle walls, and ensuring homogeneous distribution, thereby improving cleaning efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a circular spray pattern is used, then the nozzle structure is simple, but shadowing occurs and cleaning uniformity deteriorates
Solution Approach 1:
The patent applies asymmetry by changing the discharge port from a circular shape to a slit shape. This asymmetric geometry transforms the spray pattern from circular to linear, eliminating the shadowing problem that occurs with circular patterns while maintaining structural simplicity. The slit-shaped discharge port creates a linear spray that covers the substrate more uniformly without creating shadowed regions.
Solution Approach 2:
The patent transitions from a two-dimensional circular spray pattern to a one-dimensional linear spray pattern through the slit-shaped discharge port. This dimensional change in the spray geometry allows the mixed fluid to be distributed in a line rather than a circle, preventing shadowing and improving cleaning uniformity across the substrate surface.
2Productivity
If gas and liquid are mixed in the existing nozzle, then cleaning is performed, but mixing uniformity is poor leading to reduced cleaning efficiency
Solution Approach 1:
The patent segments the discharge port into multiple smaller openings along the slit shape, with each segment discharging mixed fluid at slightly different positions. This segmentation of the discharge geometry improves mixing uniformity by distributing the fluid across multiple points rather than a single circular pattern, thereby enhancing cleaning efficiency without compromising mixing quality.
3Quantity of substance
If liquid flows along the inner wall of the nozzle, then liquid is supplied to the substrate, but mixing with gas is insufficient
Solution Approach 1:
The patent extracts the liquid from the inner wall flow path and redirects it through dedicated liquid supply channels that merge with the gas flow before the slit-shaped discharge port. This extraction of liquid from the wall-flow path ensures proper mixing with gas occurs within the nozzle, achieving homogeneous mixed fluid discharge while maintaining adequate liquid supply to the substrate.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The slit-shaped discharge enhances cleaning efficiency by preventing shadows, reducing cleaning time, and ensuring uniform mixing of gas and liquid, resulting in improved cleaning quality and reliability.
Implementation Method 1
a cleaning nozzle for spraying a mixed fluid, in which liquid and gas are mixed, to a surface of the substrate in a slit shape through a slit-shaped discharge port
Implementation Method 2
a cleaning nozzle for spraying a mixed fluid, in which liquid and gas are mixed, to a surface of the substrate in a slit shape through a slit-shaped discharge port to remove foreign substances remaining on the substrate with the mixed fluid discharged from the discharge port
Data Source
AI summary
Disclosed are a substrate processing apparatus and a cleaning nozzle for substrate processing included therein. More particularly, a substrate processing apparatus, including: a support for holding a disk-shaped substrate; and a cleaning nozzle for spraying a mixed fluid, in which liquid and gas are mixed, to a surface of the substrate in a slit shape through a slit-shaped discharge port to remove foreign substances remaining on the substrate with the mixed fluid discharged from the discharge port is provided. Accordingly, a substrate processing apparatus capable of improving the mixing uniformity of gas and liquid in a slit-shaped discharge fluid; and a cleaning nozzle for substrate processing used therefor are provided.