Patterning Slit Sheet Deposition for Large Substrates
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing deposition methods for organic light-emitting display apparatuses face challenges in accurately patterning layers on large substrates, particularly due to the weight-induced sagging of fine metal masks and the complexity of aligning and separating large substrates and masks, which leads to inefficiencies in manufacturing time and quality.
Innovation Solution
A deposition apparatus featuring a transfer unit with first and second transfer units that cyclically move a substrate through deposition assemblies, including a patterning slit sheet and positional information obtaining unit, allowing precise deposition and layer formation without direct contact between the substrate and mask, thus avoiding the issues of mask sagging and alignment complexity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a fine metal mask is used for deposition on large substrates, then deposition precision can be maintained, but mask sagging occurs due to weight
Solution Approach 1:
The patent extracts the patterning function from the traditional fine metal mask and implements it through a slit sheet with multiple slits. This allows the mask structure to be divided into lighter, more manageable components that can be properly supported during deposition, eliminating the sagging problem while maintaining patterning precision.
Solution Approach 2:
The patent introduces a slit sheet as an intermediary component between the deposition source and the substrate. This slit sheet serves as a new type of mask that provides precise patterning without the weight-induced sagging problems of traditional fine metal masks, as it can be properly supported during the deposition process.
2Area of stationary object
If large substrates are used for display apparatuses, then display area and resolution are improved, but alignment and separation complexity increases
Solution Approach 1:
The patent replaces the complex mechanical alignment and separation system with a more straightforward process. The slit sheet is positioned and held during deposition, then simply removed after deposition completes, eliminating the need for complex real-time alignment mechanisms and separation procedures that become increasingly difficult with larger substrates.
3Device complexity
If traditional deposition methods are used, then manufacturing process is simple, but manufacturing time and production time increase
Solution Approach 1:
The patent implements preliminary positioning of the slit sheet before deposition begins. This allows the deposition process to proceed continuously without interruptions for alignment adjustments during deposition, significantly reducing total manufacturing time while maintaining process simplicity.
Solution Approach 2:
The patent enables continuous deposition by pre-positioning the slit sheet and maintaining its position throughout the deposition process. This eliminates interruptions and waiting time, allowing the deposition to proceed continuously and efficiently, thereby increasing manufacturing speed without complicating the overall process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient and precise deposition of materials onto large substrates, ensuring high-quality layer formation with improved manufacturing speed and reduced production time, even for substrates larger than 40 inches, by maintaining the substrate and mask separation and using a patterning slit sheet for accurate positioning.
Implementation Method 1
a deposition unit that includes a plurality of deposition assemblies, which are separated from the substrate at a predetermined distance and configured to deposit a material onto the substrate
Data Source
AI summary
A deposition apparatus includes a deposition unit including a plurality of deposition assemblies, which are separated from a substrate at a predetermined distance and deposit a material onto the substrate while a first transfer unit transfers the substrate. Each of the plurality of deposition assemblies includes a patterning slit sheet facing a deposition source nozzle unit, a positional information obtaining unit obtaining positional information regarding a position of the substrate transferred by the first transfer unit, and a sheet stage adjusting a position of the patterning slit sheet with respect to the substrate transferred by the first transfer unit according to the positional information.