SLM Image Stabilization for Digital Lithography Cross-Scan Vibrations
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Solution Overview
Problem
Digital lithography systems face challenges in image stabilization due to vibrations, leading to rough and wavy patterns in the photoresist layer, with cross-scan vibrations causing deviations that prior methods cannot correct, especially for sub-pixel movements.
Innovation Solution
The implementation of a spatial light modulator (SLM) positioned at a rotation angle relative to the in-scan direction, allowing for the detection of cross-scan vibrations and the shifting of the mask pattern within the SLM to correct for deviations, utilizing the SLM's rotation to achieve sub-pixel corrections.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional image projection systems are used without vibration correction, then the system is simpler and faster, but the manufactured patterns exhibit roughness and waviness due to vibrations
Solution Approach 1:
The system performs preliminary actions by detecting vibrations before they affect the pattern formation, and by pre-calculating the required mask pattern shifts to compensate for detected vibrations, thereby correcting cross-scan deviations before they manifest as roughness in the final pattern
Solution Approach 2:
The system implements feedback by continuously monitoring vibrations in the digital lithography system and using this information to dynamically adjust the mask pattern positioning, creating a closed-loop control system that adapts to vibration conditions in real-time
2Measurement precision
If cross-scan vibration correction is implemented using SLM mask pattern shifting, then sub-pixel accuracy is achieved, but the processing burden and computational complexity increase
Solution Approach 1:
The system replaces complex mechanical vibration correction mechanisms with an optical/digital approach using the SLM to shift mask patterns, substituting mechanical adjustment with optical modulation and digital signal processing to achieve cross-scan deviation correction
Solution Approach 2:
The system changes the parameter of mask pattern positioning within the SLM based on detected vibration conditions, dynamically adjusting the shift amount and direction of the mask pattern to compensate for cross-scan deviations while managing computational requirements
Data Source
AI summary
The present disclosure provides methods and systems for correcting the shooting of images from a spatial light modulator (SLM) to a substrate, when cross-scan vibrations, including sub-pixel cross-scan vibrations, are present. The methods and systems include shifting a mask pattern on an SLM rotated relative to the in-scan direction of travel on a substrate, shifting along an axis of the SLM to correct for cross-scan vibrations, and either delaying, or accelerating, the shooting of the mask pattern onto the substrate.