Parallel SLM Imaging Writer for Large FPD Lithography
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Solution Overview
Problem
Conventional lithography technologies for manufacturing Flat Panel Displays (FPDs) face challenges in handling large mask sizes, leading to increased costs and defects, while maintaining throughput and process yield, especially as substrate sizes grow, due to the need for high-powered illumination sources and complex exposure tool configurations.
Innovation Solution
A parallel imaging writer system utilizing multiple spatial light modulator (SLM) imaging units with low-powered LED or diode laser illumination, arranged in arrays to project light onto substrates, allowing for simultaneous writing across large areas with improved focus and illumination control, reducing the need for high-powered sources and optimizing process windows.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If conventional mask-based lithography systems are used for large FPD substrates, then large area coverage is achieved, but mask size and handling complexity increase significantly
Solution Approach 1:
The patent extracts the mask pattern information and transfers it directly to the substrate without using physical masks. The SLM devices hold the mask data in digital form and project patterns directly onto the substrate, eliminating the need for large physical masks and their associated handling complexity.
Solution Approach 2:
The patent creates digital copies of mask patterns in the SLM memory and uses these digital copies to project patterns onto the substrate. This digital copying approach replaces physical mask fabrication and handling with electronic data storage and optical projection.
2Productivity
If high-powered illumination sources are used to maintain throughput, then exposure speed is maintained, but system cost and complexity increase
Solution Approach 1:
The patent segments the illumination task across multiple SLM imaging units operating in parallel. Each unit uses low-powered illumination sources, but the combined throughput of multiple units achieves the required productivity without needing single high-powered sources.
Solution Approach 2:
The patent merges the output of multiple low-powered illumination sources to achieve the required total illumination power and throughput. Multiple SLM units with low-powered LEDs or diode lasers work together to provide sufficient exposure energy without requiring individual high-powered sources.
3Productivity
If multiple SLM imaging units are used to reduce mask production cost, then throughput increases, but system complexity increases
Solution Approach 1:
The patent designs each SLM imaging unit to be a universal, self-contained module that can independently perform complete imaging functions. This modular universality allows multiple identical units to be combined for increased throughput without proportionally increasing system complexity, as each unit is independently controllable and functionally complete.
4Area of stationary object
If conventional projection systems are used, then large mask patterns can be projected, but focus uniformity and depth of focus deteriorate
Solution Approach 1:
The patent segments the large projection area into multiple smaller imaging zones, each handled by a separate SLM imaging unit. Each unit maintains optimal focus uniformity within its smaller field of view, avoiding the focus deterioration that occurs in conventional single-unit large-area projection systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces the cost and time required for mask production, enhances throughput, and improves lithography yield by enabling efficient writing of large FPD substrates with better depth of focus and uniformity, addressing the limitations of conventional mask-based systems.
Implementation Method 1
a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one or more projection lens
Implementation Method 2
one or more projection lenses configured to receive light from the plurality of micro mirrors and project the light onto a substrate
Data Source
AI summary
System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, a parallel imaging writer system comprises a plurality of spatial light modulator (SLM) imaging units, and a controller configured to control the plurality of SLM imaging units. Each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one or more projection lens. The controller synchronizes movements of the plurality of SLM imaging units with movement of a substrate in writing a mask data to the substrate in a lithography manufacturing process.