Spatial Light Modulator Merging Standard and Custom Pattern Data
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing methods for customizing integrated circuits and electronic devices are impractical for small volumes, as they require custom masks or mask sets, limiting flexibility and cost-effectiveness in permanently loading unique information.
Innovation Solution
The technology merges standard and custom pattern data to form a custom latent image in a radiation sensitive layer over a substrate using direct writing, allowing for customization per device or batch, compatible with stepper technology and other pattern generators, and enabling reuse of standard pattern data for batch printing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If custom masks or mask sets are used for customization, then manufacturing precision is improved, but device complexity and cost increase
Solution Approach 1:
The patent uses a spatial light modulator to create a programmable virtual mask that can be digitally reconfigured, eliminating the need for physical custom masks for each customization task. The SLM displays pattern data that dynamically defines the exposure pattern, allowing one hardware system to perform multiple customization functions without requiring dedicated physical masks for each application.
Solution Approach 2:
The patent implements a universal patterning system where a single SLM-based exposure tool can handle both standard mass production patterns and custom personalized patterns through software control. The system merges standard pattern data with custom pattern data to create customized latent images, making one device capable of serving multiple functions across different production volumes and customization requirements.
2Adaptability or versatility
If custom masks are used for small volume customization, then adaptability is improved, but manufacturing cost increases
Solution Approach 1:
The patent replaces expensive physical custom masks with digitally stored pattern data that can be rapidly reproduced on the SLM. Customization information is stored as digital pattern data that can be loaded and displayed without any physical mask fabrication, significantly reducing the cost barrier for small-volume or one-off customizations while maintaining full design flexibility.
Solution Approach 2:
The patent pre-processes and stores standard pattern data in a database, allowing rapid retrieval and merging with custom data during production. This preliminary preparation of standard patterns enables quick customization without requiring time-consuming mask fabrication for each custom order, improving cost-effectiveness for small-volume production.
3Productivity
If standard pattern data is reused for batch printing, then productivity is improved, but manufacturing precision for customization may worsen
Solution Approach 1:
The patent merges standard pattern data with custom pattern data through a controlled combination process. The system overlays custom pattern information onto the standardized pattern framework, ensuring that both the efficiency of batch production and the precision of custom customization are maintained simultaneously. The merging process preserves the structural integrity of standard patterns while incorporating custom modifications.
Solution Approach 2:
The patent applies custom pattern data only to specific local regions where customization is required, while maintaining the standard pattern structure in other areas. This localized customization approach allows batch printing efficiency to be preserved in standard regions while enabling precise customization in specific zones, optimizing both productivity and manufacturing precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables efficient and flexible customization of electronic devices, reducing computational effort and hardware requirements while allowing for individualization of patterns, improving reliability and cost-effectiveness in producing customized electronic components.
Implementation Method 1
forming a custom latent image in a radiation sensitive layer over a substrate
Data Source
AI summary
The present invention relates to customizing individual workpieces, such as chip, flat panels or other electronic devices produced on substrates, by direct writing a custom pattern. Customization can be per device, per substrate, per batch or at some other small volume that makes it impractical to use a custom mask or mask set. In particular, it relates to customizing a latent image formed in a patterning sensitive layer over a substrate, merging standard and custom pattern data to form a custom pattern used to produce the customized latent image. A wide variety of substrates can benefit from the technology disclosed.