SLM Mirror Array Metrology via Grazing Incidence Interferometry

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Solution Overview

Problem

Current methods for determining the operational status of spatial light modulator (SLM) mirror arrays in lithographic exposure tools are tedious, complex, and require substantial interruptions of the exposure process, as they involve scanning or repositioning the SLM device to perform metrology at multiple positions.

Innovation Solution

The implementation of a lateral shearing interferometer system that allows for non-contact profilometry and characterization of SLM mirror arrays at off-axis or not-normal incidence, enabling metrology without interrupting the lithographic print cycle by using a grazing incidence methodology, which compares laterally sheared images to determine phase errors without scanning or repositioning the SLM.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If conventional scanning or repositioning methods are used to perform metrology on SLM mirror arrays, then measurement completeness is improved, but process interruption time increases and productivity decreases

Engineering Contradiction:
Improvemetrology completenessVSAvoidexposure process continuity
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The patent creates multiple virtual images of the SLM mirror array using a diffraction grating to split the reflected light into multiple diffraction orders. Each diffraction order forms a separate image on the detector, allowing simultaneous measurement of multiple mirror positions without physically scanning or repositioning the SLM device. This copying approach enables complete metrology data acquisition while maintaining continuous exposure process operation.

Inventive Principle:
Principle #26Copying

2Reliability

If scanning or repositioning of SLM device is performed for metrology, then operational status detection is improved, but measurement time increases and loses time

Engineering Contradiction:
Improveoperational status detectionVSAvoidmetrology execution time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The patent transforms the measurement approach from temporal scanning (moving the SLM device through different positions over time) to spatial parallelism (capturing multiple positions simultaneously in space). By using a diffraction grating to create multiple diffraction orders that form simultaneous images at different locations on the detector, the system measures multiple mirror positions at the same moment, eliminating the time required for scanning or repositioning operations.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Measurement precision

If multiple positions are measured sequentially by scanning, then measurement accuracy is improved, but device complexity and operation difficulty increase

Engineering Contradiction:
Improvemulti-position measurement accuracyVSAvoidmetrology system complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent makes the single detector serve multiple functions by capturing images from multiple SLM mirror positions simultaneously through different diffraction orders. The same detector array that would normally capture a single image now captures multiple position images at once, eliminating the need for separate scanning mechanisms, multiple detectors, or complex repositioning systems. This multi-functional approach maintains measurement precision while reducing device complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for continuous monitoring of SLM performance during the exposure process, identifying operational issues without interrupting the printing process, thereby ensuring the quality and efficiency of the lithographic process.

Implementation Method 1

a lateral shearing interferometer system that allows for non-contact profilometry and characterization of SLM mirror arrays at off-axis or not-normal incidence

Methodology Applied
Scientific EffectLateral shearing interferometry: Interference

Implementation Method 2

detect interference fringes produced by interference between the first and second optical wavefronts

Methodology Applied
Scientific EffectOptical interference: Interference

Implementation Method 3

characterization of SLM mirror arrays at off-axis or not-normal incidence, enabling metrology without interrupting the lithographic print cycle by using a grazing incidence methodology

Methodology Applied
Scientific EffectGrazing incidence reflection: Reflection

Data Source

PatentUS11099007B2Test of operational status of a digital scanner during lithographic exposure process
Publication Date: 2021.08.24 NIKON CORP
  • US11099007B2 patent drawing
  • US11099007B2 patent drawing
  • US11099007B2 patent drawing

AI summary

System and method for monitoring of performance of a mirror array of a digital scanner with a use of light, illuminating the mirror array at grazing (off-axis) incidence, and an optical imaging system that includes a lateral shearing interferometer (operated in either static or a phase-shifting condition) during and without interrupting the process of exposure of the workpiece with the digital scanner, to either simply identify problematic pixels for further troubleshooting or measure the exact magnitude of the deformation of a mirror element of the mirror array.