Slot-Coupled Plasma Source for Compact High-Density Radical Supply
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Solution Overview
Problem
Conventional plasma sources are structurally large and inefficient for miniaturization, limiting their application and increasing manufacturing costs, especially when high-density radicals are required for narrow spaces or lines.
Innovation Solution
A plasma source design that utilizes a comb-shaped resonator and a dielectric plate with a central opening, along with a separate gas supply line, to concentrate the electric field and generate high-density plasma with low power consumption, allowing for scaling down the plasma source.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional plasma sources use lower RF power frequencies, then the plasma generation is stable, but the device size becomes large and manufacturing cost increases
Solution Approach 1:
The patent changes the frequency parameter of the RF power supply from conventional lower frequencies to higher frequencies (e.g., microwave frequency around 2.45 GHz). This parameter change enables significant miniaturization of the plasma source while maintaining stable plasma generation, directly resolving the contradiction between stability and size
Solution Approach 2:
The patent introduces a vertical slot antenna structure that radiates electromagnetic waves vertically into the plasma generation chamber. This dimensional approach allows compact placement of the power supply part below the dielectric plate, achieving miniaturization without compromising plasma generation stability
2Quantity of substance
If conventional plasma sources are designed for high-density radical supply, then the radical density increases, but the device complexity and power consumption increase
Solution Approach 1:
The patent creates a localized high electric field region at the slot antenna and dielectric plate interface, concentrating electromagnetic energy precisely where gas injection occurs. This local field concentration generates high-density plasma radicals without requiring complex overall device structures or excessive total power input
Solution Approach 2:
The dielectric plate acts as an intermediary between the slot antenna and the plasma generation space. It concentrates the electromagnetic field at its surface where gas is introduced, enabling efficient radical generation with simple device architecture and reduced power consumption
3Ease of operation
If conventional plasma sources transport radicals to processing spaces, then the radicals are delivered, but significant power is lost during transport
Solution Approach 1:
The patent extracts the plasma generation function from a large-volume conventional source and concentrates it in a compact volume directly above the slot antenna. This extraction enables radicals to be generated in-situ or near the processing area, minimizing transport distance and associated power losses while maintaining delivery capability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The design enables efficient generation of high-density plasma with reduced power consumption, facilitating miniaturization and efficient radical delivery to processing spaces.
Implementation Method 1
a power supply part disposed at the housing and configured to supply a radio frequency (RF) power
Implementation Method 2
a slot formed between the power supply part and the dielectric plate and through which the RF power propagates
Implementation Method 3
a dielectric plate that is disposed at the housing, transmits the RF power from the power supply part to the plasma generation space
Implementation Method 4
a gas inlet disposed at the housing and configured to introduce a gas
Implementation Method 5
configured to supply active species of plasma produced from the gas in the plasma generation space
Data Source
AI summary
There is provided a plasma source comprising: a housing that defines a plasma generation space; a gas inlet disposed at the housing and configured to introduce a gas; a power supply part disposed at the housing and configured to supply a radio frequency (RF) power; a supply port disposed at the housing and configured to supply active species of plasma produced from the gas in the plasma generation space; a dielectric plate that is disposed at the housing, transmits the RF power from the power supply part to the plasma generation space, and has an opening at a center thereof; a slot formed between the power supply part and the dielectric plate and through which the RF power propagates; and a gas supply line disposed at the housing, and having one end connected to the gas inlet and the other end from which a gas is supplied to the opening.