SOI Transistor Gate Branch Layout for Kink Effect Reduction

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Solution Overview

Problem

Floating body silicon-on-insulator (SOI) transistors are limited by operating voltage and power due to hot carrier accumulation, and body tied SOI transistors face issues of excessive layout area, poor performance, and kink effects such as threshold voltage shift and memory effects.

Innovation Solution

A semiconductor device with a gate structure featuring a main branch and a sub-branch, where doped regions overlap the branches and source/drain regions, altering the layout design to improve kink effects and enhance performance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Power

If body tied SOI transistor layout is designed with conventional structure, then voltage and power handling capabilities are extended, but layout area becomes excessive and kink effects are induced

Engineering Contradiction:
Improvepower handling capabilityVSAvoidlayout area
Core Design Contradiction:
PowerVSArea of stationary object

Solution Approach 1:

The gate structure is divided into multiple segments including a main gate branch and one or more sub-branch gates. This segmentation allows the body region to be controlled more efficiently, extending voltage and power handling capabilities while reducing the overall layout area by eliminating the need for excessive body region extensions.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The gate structure transitions from a conventional single-branch configuration to a multi-branch configuration with sub-branches extending in different directions. This dimensional change in the gate layout enables better control of the body region, improving power handling while compacting the device footprint.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Power

If body tied SOI transistor layout is designed with conventional structure, then voltage and power handling capabilities are extended, but kink effects such as threshold voltage shift and memory effect are induced

Engineering Contradiction:
Improvepower handling capabilityVSAvoidkink effect
Core Design Contradiction:
PowerVSReliability

Solution Approach 1:

The gate structure is divided into multiple segments including a main gate branch and one or more sub-branch gates. This segmentation allows the body region to be controlled more efficiently, extending voltage and power handling capabilities while reducing the overall layout area by eliminating the need for excessive body region extensions.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different regions of the gate structure have different functions: the main gate branch provides primary control while the sub-branch gates provide localized control over specific portions of the body region. This local quality differentiation enables precise control to prevent kink effects while maintaining overall device performance.

Inventive Principle:
Principle #3Local quality

3Manufacturing precision

If doped region is aligned with sub-branch gate, then manufacturing precision is improved, but layout flexibility is reduced

Engineering Contradiction:
Improvedoped region alignmentVSAvoidlayout flexibility
Core Design Contradiction:
Manufacturing precisionVSAdaptability or versatility

Solution Approach 1:

The aligned doped region serves multiple functions: it acts as a source/drain region for the sub-branch gate, provides electrical connection, and defines the active channel region. This multi-functionality enables precise alignment to be maintained while the overall layout can still be adapted for different device configurations and applications.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS20250324724A1Semiconductor device
Publication Date: 2025.10.16 UNITED MICROELECTRONICS CORP
  • US20250324724A1 patent drawing
  • US20250324724A1 patent drawing
  • US20250324724A1 patent drawing

AI summary

A semiconductor device includes a gate structure on a substrate, in which the gate structure includes a main branch extending along a first direction on the substrate and a sub-branch extending along a second direction adjacent to the main branch. The semiconductor device also includes a first doped region overlapping the main branch and the sub-branch according to a top view and a second doped region overlapping the first doped region. The invention includes a plurality of contact plugs, the first doped region does not overlap with the contact plugs, and wherein the plurality of contact plugs comprises a first contact plug and a second contact plug disposed at different sides of the main branch.