3D SoIC Backside Bridge Structures for Chiplet Interconnects
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Solution Overview
Problem
Conventional through-silicon via connections in integrated circuit packaging are inefficient in meeting high power-efficiency and low latency requirements due to long wiring paths.
Innovation Solution
The formation of backside bridge structures on a first-tier chip allows for face-to-back bonding of second-tier chips, utilizing pre-formed bridge structures to create short electrical paths, thereby improving power efficiency and reducing latency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If through-silicon via connections are used for chiplet communication, then electrical connectivity between chiplets is achieved, but the wiring paths become long resulting in high latency and poor power efficiency
Solution Approach 1:
The patent transitions from conventional planar wiring to three-dimensional vertical interconnects by stacking chiplets and using through-silicon vias to create direct vertical electrical pathways. This dimensional change dramatically shortens the signal path length compared to lateral routing through the substrate, thereby reducing latency while maintaining reliable connectivity between chiplets.
Solution Approach 2:
The patent introduces an interposer substrate as an intermediary component that facilitates direct vertical connections between chiplets. The interposer contains through-silicon vias that act as mediators, providing short electrical pathways that bypass the need for long lateral routing through the package substrate, thus reducing latency while ensuring reliable electrical connectivity.
2Reliability
If through-silicon via connections are used for chiplet communication, then electrical connectivity between chiplets is achieved, but the long wiring paths result in high energy consumption
Solution Approach 1:
The patent transitions from conventional planar wiring to three-dimensional vertical interconnects by stacking chiplets and using through-silicon vias to create direct vertical electrical pathways. This dimensional change dramatically shortens the signal path length compared to lateral routing through the substrate, thereby reducing latency while maintaining reliable connectivity between chiplets.
Solution Approach 2:
The patent introduces an interposer substrate as an intermediary component that facilitates direct vertical connections between chiplets. The interposer contains through-silicon vias that act as mediators, providing short electrical pathways that bypass the need for long lateral routing through the package substrate, thus reducing latency while ensuring reliable electrical connectivity.
3Ease of manufacture
If conventional through-silicon via connections are used, then chiplet bonding is achieved, but the wiring paths are long and cannot meet high power-efficiency and low latency requirements
Solution Approach 1:
The patent transitions from conventional planar wiring to three-dimensional vertical interconnects by stacking chiplets and using through-silicon vias to create direct vertical electrical pathways. This dimensional change dramatically shortens the signal path length compared to lateral routing through the substrate, thereby reducing latency while maintaining reliable connectivity between chiplets.
Solution Approach 2:
The patent introduces an interposer substrate as an intermediary component that facilitates direct vertical connections between chiplets. The interposer contains through-silicon vias that act as mediators, providing short electrical pathways that bypass the need for long lateral routing through the package substrate, thus reducing latency while ensuring reliable electrical connectivity.
Data Source
AI summary
A method includes forming integrated circuits on a front side of a first chip, performing a backside grinding on the first chip to reveal a plurality of through-vias in the first chip, and forming a first bridge structure on a backside of the first chip using a damascene process. The bridge structure has a first bond pad, a second bond pad, and a conductive trace electrically connecting the first bond pad to the second bond pad. The method further includes bonding a second chip and a third chip to the first chip through face-to-back bonding. A third bond pad of the second chip is bonded to the first bond pad of the first chip. A fourth bond pad of the third chip is bonded to the second bond pad of the first chip.


