Solar Cell Electrode Fabrication via Dielectric Confinement

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

The solar cell industry faces challenges in increasing electrical generation efficiency and reducing manufacturing costs, particularly due to high photoresist consumption and electrode linewidth expansion, which affects light-trapping surfaces.

Innovation Solution

A method for fabricating solar cells involves forming photoresist patterns on a transparent conductive layer, creating openings in a dielectric layer, and using electroplating to form electrodes within these openings, which are limited by the dielectric layer's shape, thereby controlling electrode linewidth and reducing photoresist usage.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of substance

If photoresist is applied to the entire substrate surface for electrode formation, then complete electrode coverage is achieved, but photoresist consumption increases and manufacturing costs rise

Engineering Contradiction:
Improvephotoresist consumptionVSAvoidelectrode linewidth control
Core Design Contradiction:
Loss of substanceVSManufacturing precision

Solution Approach 1:

The photoresist is applied selectively only to the electrode formation areas rather than the entire substrate surface. This localized application reduces photoresist consumption while maintaining precise electrode linewidth control through the defined application pattern and subsequent dielectric layer confinement.

Inventive Principle:
Principle #3Local quality

2Manufacturing precision

If electrodes are formed without dielectric layer confinement, then formation process is simpler, but electrode linewidth expands and light-trapping surfaces decrease

Engineering Contradiction:
Improveelectrode linewidthVSAvoidprocess steps
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The dielectric layer is formed beforehand to create confinement structures before electrode deposition. This preliminary action establishes the linewidth boundaries in advance, ensuring precise electrode formation without requiring complex real-time control during the electrode formation process itself.

Inventive Principle:
Principle #10Preliminary action

3Ease of manufacture

If photoresist patterns are removed completely after electrode formation, then no photoresist residue remains, but additional processing steps are required

Engineering Contradiction:
Improveprocessing stepsVSAvoidphotoresist residue
Core Design Contradiction:
Ease of manufactureVSObject-generated harmful factors

Solution Approach 1:

The photoresist patterns are selectively removed only from non-electrode areas after electrode formation, extracting the harmful residue while preserving the electrode structures. This selective removal eliminates photoresist contamination in critical areas without requiring complete substrate processing.

Inventive Principle:
Principle #2Taking out (Extraction)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach decreases manufacturing costs, minimizes photoresist consumption, and precisely controls electrode linewidth, enhancing electrical generation efficiency and maintaining light-trapping surfaces.

Implementation Method 1

the electrodes are formed in the openings by an electroplating process in the step of forming the electrode

Methodology Applied
Scientific EffectElectroplating: Electroplating

Data Source

PatentUS9899562B2Method of fabricating a solar cell
Publication Date: 2018.02.20 AU OPTRONICS CORP
  • US9899562B2 patent drawing
  • US9899562B2 patent drawing
  • US9899562B2 patent drawing

AI summary

A method for fabricating a solar cell includes the steps of providing a substrate, forming a transparent conductive layer on a surface of the substrate, forming a plurality of photoresist patterns on the transparent conductive layer, forming a dielectric layer on the photoresist patterns and the transparent conductive layer, in which a part of a sidewall of the photoresist pattern is exposed from the dielectric layer, removing the photoresist patterns and a part of the dielectric layer covering the photoresist pattern so that a plurality of openings are defined in the remaining part of the dielectric layer, and forming plural electrodes in the openings respectively. A solar cell fabricated by the method is also disclosed.