Solar Cell Doping Openings Using Laser Patterning and Tunneling Layers
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Solution Overview
Problem
Current solar cell manufacturing methods face challenges in achieving high efficiency and productivity, particularly in the design of layers and electrodes, which affects their commercial viability.
Innovation Solution
A method for manufacturing a solar cell involving a semiconductor substrate with a tunneling layer, conductive areas, and electrodes, where laser marks are used to pattern the conductive areas, and a back surface passivation film is applied to enhance tunneling effects and prevent shunting, while a front surface passivation film and anti-reflection film are used to improve light absorption and reduce recombination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If wet etching technique or etching paste is used for forming doping opening, then manufacturing process can be simplified, but manufacturing precision and productivity are reduced
Solution Approach 1:
The patent replaces wet etching (chemical process) with laser processing (optical/thermal process) for forming doping openings. The laser beam precisely ablates the semiconductor material to create openings with controlled dimensions, eliminating the precision limitations of wet etching while maintaining process simplicity.
Solution Approach 2:
The patent changes the processing parameters by using laser power, pulse duration, and scanning speed as controllable parameters instead of chemical etchant concentration and exposure time. This allows precise control of opening size and shape through parameter optimization, achieving both high precision and manufacturing efficiency.
2Ease of manufacture
If conventional layer design is used, then manufacturing process is straightforward, but photoelectric conversion efficiency is low
Solution Approach 1:
The patent implements local quality by creating specific doping patterns with varying concentrations and types in different regions of the semiconductor substrate. The back surface features localized n-type and p-type doping areas with optimized concentrations, while the front surface has selective doping regions, allowing each area to perform its specific function for maximizing photoelectric conversion.
Solution Approach 2:
The patent uses composite material structures by combining different semiconductor materials (e.g., silicon substrate with diamond-like carbon coating, or multi-layer semiconductor compounds). This composite approach enhances both manufacturing feasibility and photoelectric conversion efficiency through material property optimization.
3Reliability
If more layers and electrodes are added to improve efficiency, then photoelectric conversion efficiency increases, but device complexity and manufacturing difficulty increase
Solution Approach 1:
The patent merges multiple functions into fewer layers and structures. For example, the back surface contact structure integrates doping regions, electrode contacts, and passivation functions into a unified design. The laser processing method also combines opening formation, doping, and patterning steps into a single processing approach, reducing overall device complexity while maintaining high efficiency.
4Ease of manufacture
If conventional etching methods are used, then manufacturing process is simple, but productivity is reduced due to low precision requirements
Solution Approach 1:
The patent replaces conventional batch wet etching processes with laser-based processing, which can be performed continuously or in rapid sequence. The laser method eliminates the need for chemical baths, masking, and multiple rinsing steps, significantly reducing cycle time and increasing productivity while maintaining process simplicity through direct material removal.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach results in improved photoelectric conversion efficiency, reduced light loss, and simplified manufacturing processes, leading to higher productivity and efficiency of the solar cells.
Implementation Method 1
patterning said conductive areas with a laser, thereby forming laser marks
Implementation Method 2
a front surface passivation film and anti-reflection film are used to improve light absorption
Data Source
Figure 1
Figure 2
Figure 3(a)~4A
AI summary
Disclosed is a method of manufacturing a solar cell, the method including forming a tunneling layer over one surface of a semiconductor substrate, forming a semiconductor layer over the tunneling layer, forming a conductive area including a first conductive area of a first conductive type and a second conductive area of a second conductive type in the semiconductor layer, and forming an electrode including a first electrode connected to the first conductive area and a second electrode connected to the second conductive area. The forming of the conductive area includes forming a mask layer over the semiconductor layer, forming a doping opening corresponding to at least one of the first conductive area and the second conductive area in the mask layer using a laser, and performing doping using the doping opening.