Solar Cell Manufacturing via Dual-Layer Mask Laser Patterning
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Solution Overview
Problem
Existing solar cell manufacturing processes face challenges in achieving high efficiency and productivity due to limitations in layer design and electrode fabrication, leading to low efficiency and productivity.
Innovation Solution
A method involving the formation of a semiconductor layer on a substrate, followed by a mask layer with a first and second layer of different materials for laser patterning and doping, which enhances the texturing and doping processes, improving the solar cell's efficiency and productivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single-layer mask is used for texturing and doping, then the process is simpler, but the semiconductor layer cannot be stably protected during texturing and doping cannot be performed at desired portions
Solution Approach 1:
The mask layer is divided into two distinct layers: a first mask layer (silicon carbide) for laser patterning and a second mask layer (silicon oxide) for protecting the semiconductor layer during texturing and controlling doping positions. This segmentation allows each layer to perform its specific function optimally, resolving the contradiction between process simplicity and doping precision.
Solution Approach 2:
The two-layer mask structure acts as an intermediary system between the laser patterning process and the texturing/doping processes. The first layer mediates the laser interaction while the second layer mediates the chemical protection during texturing and doping, enabling precise control without direct contact between the semiconductor layer and harsh processing conditions.
2Reliability
If a mask layer is used to protect the semiconductor layer during texturing, then the semiconductor layer is stable, but the manufacturing process time increases
Solution Approach 1:
The two-layer mask structure is formed in advance before the texturing and doping processes. This preliminary preparation allows the mask to be optimally positioned and configured to protect the semiconductor layer throughout subsequent processing steps, ensuring stability without requiring additional protective measures during each step.
Solution Approach 2:
The two-layer mask structure serves multiple functions simultaneously: it protects the semiconductor layer during texturing, enables precise laser patterning, and controls doping positions. This multi-functionality reduces the need for separate protective measures for each process step, thereby reducing total manufacturing time while maintaining reliability.
3Ease of manufacture
If conventional electrode fabrication is used, then the process is straightforward, but the solar cell efficiency and productivity remain low
Solution Approach 1:
The invention changes the material parameters of the mask layer by using silicon carbide for the first layer and silicon oxide for the second layer. These parameter changes enable the mask to withstand laser patterning and chemical texturing processes while maintaining structural integrity, thereby improving productivity without significantly complicating the manufacturing process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method improves the solar cell's efficiency and productivity by stabilizing the semiconductor layer during texturing and allowing precise doping, reducing manufacturing time and enhancing the solar cell's performance.
Implementation Method 1
forming an opening at the mask layer through a laser patterning using a laser
Implementation Method 2
forming a conductive region through a doping process of doping a portion of the semiconductor layer exposed through the opening with a dopant
Data Source
AI summary
Disclosed is a method for manufacturing a solar cell, the method including: forming a semiconductor layer on one surface of a semiconductor substrate; forming a mask layer including a first layer and a second layer sequentially on the semiconductor layer; texturing another surface of the semiconductor substrate using the mask layer as a mask; forming a patterned mask layer by forming an opening at the mask layer through a laser patterning using a laser; and forming a conductive region through a doping process of doping a portion of the semiconductor layer exposed through the opening with a dopant.