Solar Cell Passivation Films with Layered ALD and PECVD Deposition
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Solution Overview
Problem
Existing film preparation methods for semiconductor devices, particularly solar cells, face a trade-off between achieving high passivation effects and maintaining manufacturing efficiency, with the formation of a better passivation layer often compromising production capacity.
Innovation Solution
A film preparation method involving the formation of a first passivation layer using a slower, high-quality atomic layer deposition technique and a second passivation layer using a faster plasma-enhanced chemical vapor deposition technique, both made of the same material, to balance passivation effect and manufacturing efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a single passivation layer is formed using a high-quality preparation technique to achieve better passivation effect, then the passivation performance is improved, but the manufacturing efficiency deteriorates due to slow formation speed
Solution Approach 1:
The passivation layer is divided into two distinct layers: a first passivation layer formed by a slow, high-quality technique (such as atomic layer deposition) to ensure excellent passivation effect, and a second passivation layer formed by a fast technique (such as plasma-enhanced chemical vapor deposition) to increase manufacturing efficiency. This segmentation allows each layer to fulfill different functional requirements, resolving the contradiction between quality and productivity.
Solution Approach 2:
Different regions of the passivation structure are assigned different qualities: the first passivation layer adjacent to the substrate is optimized for passivation performance with low hydrogen content and high negative charge density, while the second passivation layer is optimized for formation speed. This local differentiation of quality allows the system to achieve both excellent passivation and high manufacturing efficiency.
2Productivity
If a single passivation layer is formed using a fast preparation technique to improve manufacturing efficiency, then the production capacity is increased, but the passivation effect deteriorates
Solution Approach 1:
The passivation structure is segmented into two layers with different formation techniques. The first layer uses a slow, high-quality technique to ensure passivation performance, while the second layer uses a fast technique to boost productivity. This segmentation eliminates the need to choose between speed and quality, as both are achieved in different layers.
Solution Approach 2:
The first passivation layer with excellent passivation properties is formed first as a preliminary action, creating a high-quality base layer. Then the second passivation layer is formed rapidly on top of it. This preliminary action ensures that the critical passivation function is established before prioritizing manufacturing speed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves improved passivation performance while maintaining efficient production by utilizing the strengths of both techniques, ensuring a uniform and reliable passivation film with enhanced photoelectric conversion efficiency.
Implementation Method 1
the first preparation technique includes atomic layer deposition
Implementation Method 2
the second preparation technique includes plasma-enhanced chemical vapor deposition
Data Source
AI summary
The present application provides a film preparation method, a solar cell, a photovoltaic device, and a photovoltaic system. The film preparation method includes forming a first passivation layer on a first surface of a substrate by using a first preparation technique; and forming a second passivation layer on a surface of the first passivation layer away from the substrate by using a second preparation technique, a material of the second passivation layer is the same as that of the first passivation layer; wherein a passivation layer forming speed of the first preparation technique is lower than that of the second preparation technique, and a passivation effect of the first passivation layer is better than that of the second passivation layer.