Shadow Mask Electrode Patterning for Solar Cell Manufacturing

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Solution Overview

Problem

The manufacturing process of solar cells is complicated due to the use of photolithography for forming electrodes, leading to reduced productivity.

Innovation Solution

The formation of electrodes in solar cells is achieved through a shadow mask process, specifically using a deposition process to create patterned layers of transparent oxide materials like indium and tin, allowing for a continuous in-situ formation of transparent electrode and pattern layers.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If photolithography process is used to form electrode, then manufacturing precision is improved, but device complexity increases and productivity decreases

Engineering Contradiction:

Improveelectrode pattern precisionVSAvoidmanufacturing process complexity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent extracts and removes the photolithography step from the electrode formation process, replacing it with a shadow mask deposition process. This eliminates the need for photoresist coating, patterning, and removal steps, thereby reducing manufacturing process complexity while maintaining electrode pattern precision through the shadow mask technique.

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The patent replaces the chemical-based photolithography system with a physical vapor deposition system using shadow mask. This substitution eliminates complex chemical processes (photoresist application, development, etching) and replaces them with a simpler physical deposition process that achieves the same patterning function with fewer steps.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If photolithography process is used to form electrode, then manufacturing precision is improved, but productivity is reduced

Engineering Contradiction:

Improveelectrode pattern precisionVSAvoidmanufacturing productivity

Core Design Contradiction:

Manufacturing precisionVSProductivity

Solution Approach 1:

By removing the multi-step photolithography process (photoresist coating, baking, exposure, development, etching, stripping) and replacing it with a single shadow mask deposition step, the patent significantly reduces the number of process steps and time required, thereby improving manufacturing productivity while preserving electrode pattern precision.

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The shadow mask deposition process allows for continuous electrode formation without the interruptions inherent in photolithography (multiple sequential steps with intermediate processing). The deposition can be performed in a single continuous operation, enhancing manufacturing throughput and productivity.

Inventive Principle:

Principle #20Continuity of useful action

3Device complexity

If shadow mask process is used instead of photolithography, then device complexity is reduced, but manufacturing precision may be compromised

Engineering Contradiction:

Improvemanufacturing process complexityVSAvoidelectrode pattern precision

Core Design Contradiction:

Device complexityVSManufacturing precision

Solution Approach 1:

The shadow mask serves as an intermediary tool that transfers the desired electrode pattern onto the transparent electrode layer during deposition. This intermediary approach achieves precise patterning through the mask's physical geometry, matching or exceeding photolithography precision while simplifying the overall process by eliminating photoresist-based methods.

Inventive Principle:

Principle #24Intermediary (Mediator)

4Productivity

If shadow mask process is used instead of photolithography, then productivity is enhanced, but contact resistance may increase

Engineering Contradiction:

Improvemanufacturing productivityVSAvoidcontact resistance

Core Design Contradiction:

ProductivityVSReliability

Solution Approach 1:

The patent optimizes deposition parameters (such as deposition rate, temperature, and material composition) in the shadow mask process to ensure adequate material coverage and proper material properties. By carefully controlling these parameters, the patent achieves both high productivity and low contact resistance, preventing the trade-off from materializing.

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method simplifies the manufacturing process and enhances productivity by eliminating the need for photolithography, resulting in improved efficiency and reduced contact resistance.

Implementation Method 1

a first electrode provided on one surface of the first transparent electrode layer, wherein the first electrode includes a first pattern layer patterned by a deposition process using a shadow mask

Methodology Applied

Scientific EffectPhysical Vapour Deposition: Physical Vapour Deposition

Data Source

PatentUS12543424B2Solar cell and manufacturing method therefor

Publication Date: 2026.02.03 JUSUNG ENG

AI summary

The present inventive concept provides a solar cell and a manufacturing method therefor, the solar cell comprising: a semiconductor substrate; a first transparent electrode layer provided on one surface of the semiconductor substrate; and a first electrode provided on one surface of the first transparent electrode layer, wherein the first electrode comprises a first pattern layer pattern-formed through a deposition process using a shadow mask.