Solid Source Container Inlet Plenum for CVD Precursor Delivery
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Solution Overview
Problem
Vaporization of solid precursor materials in CVD and ALD processes is hindered by issues such as deposit buildup, condensation, and inconsistent vapor flow, leading to equipment downtime and poor film quality.
Innovation Solution
A vessel design with a segmented interior volume, a lid with a fluid inlet and outlet, and a separator that directs carrier gas through the precursor material to form a consistent gaseous precursor stream, preventing condensation and ensuring continuous flow.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If solid precursor material is heated to form vapor, then precursor delivery is achieved, but deposit buildup and condensation occur in the vessel and delivery lines
Solution Approach 1:
The vessel interior volume is segmented into a lower volume containing the solid precursor material and an upper volume for vaporization, separated by a fritted separator. This segmentation prevents direct contact between the solid precursor and the vaporization zone, reducing deposit buildup in delivery lines while maintaining effective precursor vapor delivery.
Solution Approach 2:
A fritted separator acts as an intermediary component between the solid precursor material and the carrier gas flow. The separator allows carrier gas to pass through and pick up precursor vapor while preventing solid particles and liquid condensate from entering the delivery lines, thus eliminating deposit buildup without compromising precursor delivery.
2Quantity of substance
If solid precursor material is vaporized, then precursor stream is formed, but cold spots and inconsistent vapor flow occur
Solution Approach 1:
The vessel design creates different local zones: the lower volume maintains higher temperature for solid precursor heating, while the upper volume provides a controlled vaporization zone. The fritted separator ensures uniform carrier gas distribution through the precursor bed, creating consistent local conditions for vapor formation and eliminating cold spots that cause inconsistent flow.
Solution Approach 2:
The system uses controlled carrier gas flow through the fritted separator to maintain consistent vaporization conditions. The pneumatic design ensures uniform gas distribution across the precursor material surface, preventing stagnant zones and cold spots while delivering consistent precursor vapor flow to the reaction chamber.
3Productivity
If extended equipment downtime is avoided, then productivity increases, but deposit removal operations are required
Solution Approach 1:
The fritted separator converts the potentially harmful effect of hot precursor vapor by allowing it to pass through while blocking solid particles and condensate. This transforms the vaporization process into a beneficial operation that delivers clean precursor vapor without the harmful deposits that would otherwise require time-consuming removal operations, thereby increasing equipment uptime and productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The vessel provides a consistent and reproducible precursor delivery, reducing downtime and improving film quality by avoiding 'cold spots' and deposit buildup, ensuring efficient vaporization and conveying of precursor materials.
Implementation Method 1
a fritted separator to prevent liquid or solid precursor material from entering the delivery lines
Implementation Method 2
the solid precursor material is heated to its gaseous phase without forming an intermediate liquid phase
Implementation Method 3
the at least one carrier gas and the gaseous phase of the precursor combine to form the fluid stream
Data Source
AI summary
A vessel for conveying a precursor fluid from the vessel, comprising: an interior volume having an upper volume and a lower volume, wherein the two volumes are in communication and the lower volume contains precursor; a lid comprising a fluid inlet directing carrier gas into the vessel, a âTâ fluid outlet, a sidewall having an upper lip wherein the upper lip contacts the lid; a separator interposed between the lid and the sidewall wherein the separator resides adjacent the upper lip and segments the interior volume into the upper volume and a lower volume; and an inlet plenum in communication with the fluid inlet having a plenum chamber opening towards the separator to direct the carrier gas through the separator and towards the precursor. A method for using the apparatus is also disclosed.