Solid Source Sublimator Filtration for Stable Vapor Delivery
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Solution Overview
Problem
Existing solid source reactant delivery systems face challenges in efficiently vaporizing and maintaining vapor phase reactants at elevated temperatures to prevent condensation in semiconductor processing, particularly for substances with low vapor pressure, leading to potential clogging and reduced deposition efficiency.
Innovation Solution
A solid source chemical sublimator system comprising a housing with a filter and serpentine flow path, where a filter with controlled porosity restricts the passage of solid reactants, allowing carrier gas to effectively sublimate and saturate with vaporized reactants, and a heating mechanism to maintain the reactants above vaporization temperature, ensuring continuous flow and preventing condensation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a filter with controlled porosity is introduced to restrict solid reactant passage, then clogging is reduced and vaporization efficiency is improved, but device complexity increases
Solution Approach 1:
The patent applies a filter with controlled porosity to restrict the passage of solid reactants while allowing carrier gas to pass through. This porous filter prevents solid particles from clogging the system while maintaining efficient vaporization of the reactant, directly resolving the contradiction between productivity and device complexity.
2Productivity
If heating is intensified to maintain reactants above vaporization temperature, then deposition efficiency is improved, but energy consumption increases
Solution Approach 1:
The patent utilizes the phase transition of sublimation for solid reactants with low vapor pressure. By heating the reactant above its sublimation temperature, the solid directly transitions to vapor phase without passing through the liquid phase, enabling efficient deposition while controlling energy consumption through targeted temperature maintenance.
Solution Approach 2:
The patent changes the temperature parameter to maintain reactants above their vaporization temperature. This parameter change enables continuous vaporization and prevents condensation in the processing system, improving deposition efficiency while managing energy requirements through controlled thermal conditions.
3Reliability
If the carrier gas flow rate is increased to prevent condensation, then reactant delivery reliability is improved, but system complexity increases
Solution Approach 1:
The patent uses carrier gas flow through the heated chamber to transport vaporized reactant to the processing zone. The controlled gas flow prevents condensation by maintaining thermal conditions and provides reliable reactant delivery, achieving improved reliability without excessive system complexity through straightforward pneumatic transport.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system ensures efficient vaporization and delivery of reactants, reducing clogging risks and maintaining reactant vaporization throughout the processing system, thereby enhancing deposition efficiency and extending the time between recharging treatments.
Implementation Method 1
The filter can have a porosity configured to restrict a passage of a solid chemical reactant therethrough
Implementation Method 2
A solid source chemical sublimator can include a housing configured to hold solid chemical reactant therein
Data Source
AI summary
Herein disclosed are systems and methods related to solid source chemical sublimator vessels and corresponding deposition modules. The solid source chemical sublimator can include a housing configured to hold solid chemical reactant therein. A lid may be disposed on a proximal portion of the housing. The lid can include a fluid inlet and a fluid outlet and define a serpentine flow path within a distal portion of the lid. The lid can be adapted to allow gas flow within the flow path. The solid source chemical sublimator can include a filter that is disposed between the serpentine flow path and the distal portion of the housing. The filter can have a porosity configured to restrict a passage of a solid chemical reactant therethrough.