Solid-State Electron Detector for High-Speed SEM Inspection

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Solution Overview

Problem

Scanning electron microscopes (SEMs) face challenges in achieving high-speed and high-resolution inspections due to the limitations of conventional photon-based scintillator detectors, which are slow and inefficient, and the placement of detectors is restricted by the final objective lens, limiting the detection of secondary and backscattered electrons.

Innovation Solution

The development of solid-state electron detectors that convert incident electrons into measurable charges within a single integral semiconductor structure, allowing for faster processing speeds and improved resolution by positioning detectors closer to the sample, and using a pure boron coating for efficient detection of low-energy electrons.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Speed

If conventional photon-based scintillator detectors are used, then the SEM can detect secondary electrons, but the detection speed is slow and processing efficiency is reduced

Engineering Contradiction:
Improvedetection speedVSAvoidprocessing efficiency
Core Design Contradiction:
SpeedVSProductivity

Solution Approach 1:

The patent replaces the conventional photon-based scintillator detector system with a solid-state electron detector that directly converts incident electrons into measurable charges. This substitution eliminates the intermediate photon conversion step, thereby increasing detection speed and processing efficiency without sacrificing sensitivity.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Measurement precision

If the final objective lens is placed close to the sample for high-resolution imaging, then image quality is improved, but the placement of detectors is restricted and detection efficiency is reduced

Engineering Contradiction:
Improveimage resolutionVSAvoiddetection efficiency
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The patent extracts the detector from the conventional position behind the final objective lens and places it in a new location where it can detect both secondary and backscattered electrons simultaneously. This repositioning allows the final objective lens to remain close to the sample for high-resolution imaging while the detector operates independently with improved detection efficiency.

Inventive Principle:
Principle #2Taking out (Extraction)

3Productivity

If a large solid angle detector is placed close to the sample for high-speed detection, then detection speed is improved, but the final objective lens placement is compromised and imaging resolution deteriorates

Engineering Contradiction:
Improvedetection speedVSAvoidimaging resolution
Core Design Contradiction:
ProductivityVSMeasurement precision

Solution Approach 1:

The patent positions the detector in a three-dimensional space that allows it to collect electrons from a large solid angle without interfering with the final objective lens placement. The detector is arranged to receive secondary electrons from above and backscattered electrons from the side, enabling high-speed detection while maintaining high imaging resolution.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

4Reliability

If conventional scintillator-based detectors are used, then secondary electron detection is achieved, but the detector response time is slow with multiple time constants

Engineering Contradiction:
Improvedetection accuracyVSAvoidresponse time
Core Design Contradiction:
ReliabilityVSDuration of action of moving object

Solution Approach 1:

The patent replaces the scintillator-based detection mechanism with a solid-state detector that directly converts electron kinetic energy into electrical charges. This substitution eliminates the slow photon emission and detection process, achieving fast response times with a single time constant while maintaining detection accuracy through direct electron-to-charge conversion.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enables SEMs to operate at higher speeds (up to 100MHz) with improved sensitivity and efficiency, providing higher resolution images and faster material analysis, while reducing production and operational costs.

Implementation Method 1

solid-state electron detectors that convert incident electrons into measurable charges within a single integral semiconductor structure

Methodology Applied
Scientific EffectElectron-to-charge conversion: Photoelectric Effect

Implementation Method 2

using a pure boron coating for efficient detection of low-energy electrons

Methodology Applied
Scientific EffectElectron detection in semiconductor: Photoelectric Effect

Implementation Method 3

The light emission from scintillator has a decay time constant of several, or many, tens of ns

Methodology Applied
Scientific EffectScintillation: Scintillation

Data Source

PatentEP3140849B1Scanning electron microscope and methods of inspecting and reviewing samples
Publication Date: 2021.07.21 KLA CORP
  • EP3140849B1 patent drawingFigure 1
  • EP3140849B1 patent drawingFigure 2
  • EP3140849B1 patent drawingFigure 3a

AI summary

A scanning electron microscope incorporates a multi-pixel solid-state electron detector. The multi-pixel solid-state detector may detect back-scattered and/or secondary electrons. The multi-pixel solid-state detector may incorporate analog-to-digital converters and other circuits. The multi-pixel solid state detector may be capable of approximately determining the energy of incident electrons and/or may contain circuits for processing or analyzing the electron signals. The multi-pixel solid state detector is suitable for high-speed operation such as at a speed of about 100 MHz or higher. The scanning electron microscope may be used for reviewing, inspecting or measuring a sample such an unpatterned semiconductor wafer, a patterned semiconductor wafer, a reticle or a photomask. A method of reviewing or inspecting a sample is also described.