Solid-State EUV Light Source Power Supply
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Solution Overview
Problem
Existing EUV light sources face limitations due to the use of magnetic switches in power supplies, which result in slow and large physical devices, hindering the development of high brightness, reliable, and compact EUV light sources.
Innovation Solution
The development of a solid-state pulsed power supply system that includes a charging circuit, a pre-ionization circuit, and a solid-state switching circuit, which uses inductive coupling to generate a pre-ionization pulse and discharge capacitance to form a plasma, thereby overcoming the limitations of magnetic switches.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If magnetic switches are used in power supplies for EUV light sources, then the system can operate with existing technology, but the device becomes slow and physically large
Solution Approach 1:
The patent replaces magnetic switches with solid-state switching circuits in the power supply system. This substitution eliminates the mechanical/magnetic components that cause slow switching and large physical size, while maintaining operational reliability through solid-state technology that offers faster switching speeds and compact form factor.
Solution Approach 2:
The patent changes the switching mechanism from magnetic to solid-state, fundamentally altering the operating parameters of the power supply. This parameter change enables faster switching speeds and reduced physical dimensions while maintaining the necessary operational reliability for EUV light generation.
2Reliability
If magnetic switches are used in power supplies for EUV light sources, then the system can operate with existing technology, but the device becomes physically large
Solution Approach 1:
The patent replaces magnetic switches with solid-state switching circuits, substituting a bulky magnetic field-based system with a compact solid-state electronic system. This replacement dramatically reduces the physical volume of the power supply while maintaining operational reliability.
Solution Approach 2:
The patent fundamentally changes the physical state of the switching components from magnetic to solid-state, which inherently reduces the physical size of the device while preserving the necessary operational characteristics for reliable EUV light generation.
3Device complexity
If conventional power supplies are used, then the system is simpler to implement, but the brightness and performance of EUV light are limited
Solution Approach 1:
The patent introduces a pre-ionization circuit that performs preliminary ionization of the gas before the main plasma generation. This preliminary action prepares the gas state to enable higher brightness EUV light generation while the solid-state switching circuit maintains manageable system complexity through efficient control.
Solution Approach 2:
The patent changes the operational parameters of the plasma generation process by using solid-state switching circuits that can deliver higher peak currents and faster switching. This parameter change enables significantly higher EUV light brightness while the modular circuit design keeps the overall system complexity manageable.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables the generation of high-power, high-brightness EUV light with improved reliability, stability, and compactness, while avoiding the use of electrodes and allowing for flexible operation and adjustable pulse conditions.
Implementation Method 1
generate a pre-ionization pulse through inductive coupling that causes the ionization of gas in the plasma generation region
Implementation Method 2
discharge a capacitance through an inductive coupling to form a plasma in the plasma generation region
Implementation Method 3
discharge a capacitance through an inductive coupling
Implementation Method 4
A magnetic core is positioned around a portion of the chamber and is configured to generate plasma in the plasma generation region so that the plasma converges in the plasma confinement region
Implementation Method 5
A plasma generation region that defines a plasma confinement region... light generated by the plasma to propagate out of the light source
Data Source
AI summary
An EUV light source includes a chamber that defines a plasma confinement region. A magnetic core is positioned around the chamber and is configured to generate a plasma in the plasma generation region so that the plasma converges in the plasma confinement region. A power delivery section is positioned around the magnetic core. A power supply includes a charging circuit, a pre-ionization circuit, and a solid state switching circuit having an output coupled to the magnetic core. The power supply is configured to isolate the charging circuit from the power delivery section and to generate a pre-ionization pulse through inductive coupling that causes ionization of gas in the plasma generation region. The solid state switching circuit is configured to discharge a capacitance through inductive coupling to form a plasma in the plasma generation region.