Solution Jetting Device Backlash Control

The patent applies preliminary action by performing a suck-back operation before the actual jetting. The syringe pump sucks back a predetermined volume of solution into the syringe barrel before jetting, which eliminates backlash errors in the drive mechanism. This preliminary suck-back action ensures that the syringe plunger is firmly engaged with the solution, eliminating play or clearance that would cause inaccurate dosing during the subsequent jetting operation.

The patent changes the operational parameters of the syringe pump by controlling it to operate in two distinct phases: a suck-back phase where the plunger moves to draw solution into the barrel, and a jetting phase where the plunger moves to eject the solution. By carefully controlling the volume sucked back and the timing of the jetting operation, the system achieves high accuracy in the amount of solution delivered, transforming the unreliable continuous operation into a controlled two-stage process.

The patent applies parameter changes by precisely controlling the vertical position of the nozzle relative to the solution surface in the measurement container. The nozzle is positioned at a specific height range where the distal end is submerged in the jetted solution by a controlled amount (0.5-2.0 mm). This optimized positioning parameter simultaneously achieves stable solution delivery and minimizes harmful adhesion, resolving the contradiction between these two requirements.

The patent applies partial action by having the nozzle distal end partially submerged in the solution rather than completely above or completely below the surface. This partial submersion (0.5-2.0 mm) is the optimal amount that provides enough contact for stable jetting while limiting excessive contact that would cause harmful adhesion. The suck-back volume is also set to a partial amount that is sufficient to eliminate backlash but not so large as to waste solution.

The patent applies parameter changes by optimizing the nozzle submersion depth to a specific range (0.5-2.0 mm). This precise parameter setting ensures that the nozzle distal end is enough submerged to stabilize the jetted solution amount through controlled adhesion, while not being so deep that excessive solution accumulates and forms droplets on the nozzle. The parameter is carefully chosen to balance these competing effects.

The patent applies partial action by having the nozzle distal end partially submerged rather than fully immersed. This partial submersion (0.5-2.0 mm) provides just enough contact with the solution to stabilize the jetting process and control adhesion, while limiting the contact area to prevent excessive solution accumulation that would form droplets. The suck-back volume is also set to a partial amount sufficient for eliminating backlash without causing excessive solution retention.