Solution Treatment Apparatus Circulation Control
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Solution Overview
Problem
In photolithography processes, treatment solutions in semiconductor manufacturing often contain bubbles and particles that cause coating unevenness and defects, leading to wasteful consumption when dummy discharges are performed to prevent particle growth in filters.
Innovation Solution
A solution treatment apparatus with a supply pipeline, filter, pump, circulation pipeline, and control unit that circulates treatment solution between the supply and circulation pipelines when the supply nozzle is not in use, preventing particle growth without dummy discharges.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If dummy discharge is performed to prevent particle growth in the filter, then particle growth is suppressed, but treatment solution is wasted
Solution Approach 1:
The system maintains continuous circulation of treatment solution through the filter even when supply nozzles are not in use, preventing particle growth without requiring periodic dummy discharges. The circulation pump keeps the solution moving through the filter continuously, ensuring particles do not settle and grow while avoiding waste of treatment solution.
Solution Approach 2:
The circulation system allows the treatment solution to serve itself by continuously passing through the filter, which automatically prevents particle growth. The system uses its own resources (the circulation pump and existing solution flow paths) to maintain solution quality without requiring external intervention or waste discharge.
2Reliability
If treatment solution is circulated when supply nozzle is not in use, then particle growth is prevented, but energy is consumed
Solution Approach 1:
The circulation pump operates dynamically, adjusting its operation based on the state of supply nozzles. When supply nozzles are active, circulation may be reduced or stopped. When supply nozzles are inactive, circulation is maintained to prevent particle growth. This dynamic adjustment optimizes energy consumption while ensuring solution quality is maintained only when necessary.
3Manufacturing precision
If filter capacity is increased to improve filtration, then particle removal is enhanced, but particle growth at filter interface increases
Solution Approach 1:
Continuous circulation prevents the treatment solution from remaining stagnant at the filter interface, even in large capacity filters. The constant flow prevents particles from settling and accumulating at the filter interface where they could grow, while still allowing the filter to provide effective particle removal through its extended filtration surface area.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach efficiently suppresses particle growth in treatment solutions without wastefully consuming the solution, reducing downtime and maintaining solution quality.
Implementation Method 1
a pump that is provided in the supply pipeline on a secondary side of the filter apparatus
Implementation Method 2
a filter apparatus that is provided in the supply pipeline, and filtrates the treatment solution and removes foreign matters mixed in the treatment solution
Data Source
AI summary
A solution treatment apparatus connected to a supply nozzle that supplies a treatment solution to a substrate, includes: a supply pipeline connecting a treatment solution storage container and the supply nozzle; a filter apparatus provided in the supply pipeline; a pump on a secondary side of the filter apparatus; a circulation pipeline connecting a discharge side of the pump and an intake side of the filter apparatus; a supply control valve provided in the supply pipeline on a secondary side of the pump; a circulation control valve provided in the circulation pipeline; and a control unit, wherein the control unit opens the circulation control valve and drives the pump when supply of the treatment solution from the supply nozzle to the substrate is stopped by closing the supply control valve, to thereby circulate the treatment solution between the supply pipeline having the filter apparatus and the circulation pipeline.