Solvent Purification System Parallel Filtration
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Solution Overview
Problem
The semiconductor industry faces challenges in producing high-purity solvents for manufacturing ultra-fine integrated circuits due to contamination from metal impurities and particles, which can lead to defects and reduced manufacturing yields, despite existing purification methods being inadequate in effectively managing these contaminants.
Innovation Solution
A purification system and method using multiple filters with varying pore sizes arranged in parallel, including a first filter unit with a larger pore size, a second filter unit with smaller pore size filters arranged in parallel, a third filter unit with an ion exchange membrane, and a fourth filter unit with even smaller pore size filters, to achieve high flow rates and ultra-pure solvents by effectively removing metallic impurities and particles.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple filters with small pore sizes are arranged in series, then purification precision is improved, but flow rate decreases and back pressure increases
Solution Approach 1:
The filtration system is divided into multiple filter units with different pore sizes (first, second, third, and fourth filter units) arranged in series. Each filter unit contains multiple filters that are parallel-connected within the unit. This segmentation allows the system to achieve high purification precision through multiple stages while maintaining flow rate by providing parallel flow paths within each stage.
Solution Approach 2:
The invention transitions from a single-dimension series arrangement to a multi-dimensional configuration where filters are arranged both in series (between filter units) and in parallel (within filter units). This dimensional change allows simultaneous achievement of high purification precision (through series arrangement) and maintained flow rate (through parallel arrangement within units).
2Manufacturing precision
If multiple filters with small pore sizes are arranged in series, then purification precision is improved, but device complexity increases
Solution Approach 1:
The complex filtration system is segmented into four distinct filter units, each with a specific pore size range. Each unit contains multiple parallel filters, making the overall complex system manageable through modular segmentation. This allows for easier maintenance, replacement, and operation compared to a single complex filter assembly.
3Manufacturing precision
If filters with small pore sizes are used, then particle removal is improved, but back pressure increases
Solution Approach 1:
The filtration process is segmented into multiple stages with progressively smaller pore sizes. Each stage removes a portion of particles, distributing the removal burden across stages rather than requiring a single filter to remove all particles, thereby reducing back pressure while maintaining high particle removal efficiency.
Solution Approach 2:
The invention introduces parallel filter arrangements within each filter unit, creating multiple flow paths. This dimensional change allows the system to maintain low back pressure by distributing flow across multiple paths while still achieving high particle removal through the series arrangement of filter units with progressively smaller pores.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach results in solvents with significantly reduced metal impurities and particles, improving semiconductor wafer yields and productivity by maintaining high flow rates without increasing back pressure, thereby enhancing the quality and purity of solvents used in semiconductor manufacturing.
Implementation Method 1
passing the organic solvent through a first filter unit, a second filter unit, a third filter unit, and a fourth filter unit
Implementation Method 2
the filtration medium in the at least one third filter includes an ion exchange membrane
Data Source
Figure 1
AI summary
The present disclosure is directed to methods and systems of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.