Source Gas Supply Apparatus Venturi Mixing
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Solution Overview
Problem
Existing source gas supply apparatuses face challenges in accurately measuring and controlling the flow rate of source gases with low vapor pressure raw materials, leading to instability and reduced measurement accuracy due to the need for larger mass flow meters and increased carrier gas flow rates.
Innovation Solution
A source gas supply apparatus that incorporates a raw material container, a carrier gas supply path, a source gas supply flow path, a diluent gas supply path, and a gas mixer utilizing the Venturi effect to mix the source gas with a diluent gas, allowing for efficient and stable supply of source gas while reducing carrier gas flow rates and enabling the use of smaller mass flow meters for improved measurement accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the carrier gas flow rate is increased to transport source gas, then the source gas can be supplied more reliably, but the measurement accuracy of the mass flow meter decreases and the system requires larger equipment
Solution Approach 1:
A diluent gas is introduced as an intermediary substance to mix with the source gas downstream of the mass flow meter. This allows the mass flow meter to measure only the carrier gas flow accurately without being affected by the low vapor pressure source gas, while the diluent gas carries the source gas to the processing container, thus resolving the contradiction between reliable source gas supply and accurate flow measurement
Solution Approach 2:
The gas supply system is segmented into distinct functional zones: the mass flow meter measures only the carrier gas flow in a controlled region, while the source gas vaporization and diluent gas mixing occur in a separate downstream region. This segmentation allows accurate measurement of the dominant carrier gas flow without interference from the微量 source gas, resolving the measurement accuracy issue while maintaining reliable source gas delivery
2Measurement precision
If a larger mass flow meter is used to measure low flow rates accurately, then measurement accuracy improves, but the device complexity and cost increase
Solution Approach 1:
The diluent gas acts as a mediator that allows the use of a standard-sized mass flow meter calibrated for carrier gas measurement. By introducing the diluent gas downstream, the system achieves accurate source gas delivery without requiring an oversized or specially calibrated mass flow meter, thus reducing device complexity and cost while maintaining measurement precision for the carrier gas portion
3Measurement precision
If the carrier gas flow rate is reduced, then measurement accuracy improves and equipment size decreases, but the source gas vaporization and transport efficiency decreases
Solution Approach 1:
The diluent gas serves as an intermediary carrier that takes over the task of transporting vaporized source gas to the processing container. This allows the carrier gas flow rate to be reduced for accurate mass flow meter measurement, while the diluent gas maintains source gas transport efficiency, thus resolving the contradiction between measurement precision and productivity
Solution Approach 2:
The system utilizes pneumatic principles by introducing a diluent gas flow that merges with the carrier gas downstream of the mass flow meter. This pneumatic addition allows the main carrier gas flow to be kept low for accurate measurement, while the combined flow (carrier gas + diluent gas) maintains sufficient volume and velocity for efficient source gas transport to the processing container
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus stabilizes the vaporization flow rate of raw materials and enhances measurement accuracy by efficiently transporting source gas through the Venturi effect, allowing for precise control and higher accuracy in source gas supply, even at low flow rates.
Implementation Method 1
a gas mixer provided at a merging portion of the source gas supply flow path and the diluent gas supply flow path, and configured to mix the source gas with the diluent gas via a Venturi effect
Data Source
AI summary
A source gas supply apparatus that supplies a source gas into a processing container, includes: a raw material container configured to contain a raw material, and to vaporize the raw material; a source gas supply flow path configured to supply the source gas including the vaporized raw material into the processing container; a flow rate measurement part installed in the source gas supply flow path, and configured to measure a flow rate of the source gas; a diluent gas supply flow path joining a downstream side of the flow rate measurement part in the source gas supply flow path, and configured to supply a diluent gas for diluting the source gas; and a gas mixer provided at a merging portion of the source gas supply flow path and the diluent gas supply flow path, and configured to mix the source gas with the diluent gas via a Venturi effect.