SPAD Multiplication Region Layout for Low Dark Count Detection
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Solution Overview
Problem
Single-photon avalanche diodes (SPADs) face high dark count rates and require elevated operating voltages due to excessive doping concentrations and narrow depletion regions, leading to high tunneling-induced carriers and early breakdowns, which complicates photon detection and increases power consumption.
Innovation Solution
A single-photon avalanche diode design incorporating a double diffusion region for forming a multiplication region with low breakdown voltage, a guard ring to reduce electric field at corners, and a buried layer for isolation to minimize crosstalk and prevent electrical shorts, allowing for lower operating voltages and increased excess bias range.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If excessive doping concentration is used in n-type well and p+ region, then the depletion region becomes extremely narrow, but the dark count rate increases due to tunneling-induced carriers
Solution Approach 1:
The patent applies local quality by creating a guard ring region with different doping characteristics surrounding the active detection region. This guard ring has moderate doping concentration that differs from both the heavily doped contact regions and the lightly doped active region, thereby locally optimizing the electric field distribution to suppress tunneling effects at critical perimeter areas while maintaining narrow depletion width in the center for fast response.
2Object-generated harmful factors
If the operating voltage is increased to reduce dark count rate, then the breakdown voltage must be elevated, but this necessitates operation at high voltages
Solution Approach 1:
The patent employs parameter changes by systematically varying the doping concentrations across different regions (heavy doping in contact regions, moderate doping in guard ring, light doping in active region) and adjusting the depletion region width through controlled oxidation processes. These parameter modifications enable the device to achieve low dark count rates at lower operating voltages by optimizing the electric field distribution and breakdown characteristics.
3Device complexity
If excessive doping concentration is used to form the multiplication region, then the device structure is simplified, but the breakdown voltage becomes extremely narrow and leads to early breakdown on edges
Solution Approach 1:
The patent applies segmentation by dividing the device into distinct functional regions: a central active detection region, a surrounding guard ring region with intermediate doping, and outer contact regions with heavy doping. This segmentation allows each region to be optimized independently - the active region maintains narrow depletion for fast response while the guard ring provides field management to prevent edge breakdown, thus improving reliability without excessive complexity.
4Speed
If the depletion region is made extremely narrow for fast response, then the response speed increases, but the photon detection probability decreases
Solution Approach 1:
The patent addresses this contradiction by transitioning from a uniform one-dimensional doping profile to a multi-dimensional graded doping structure. The doping concentration varies in multiple dimensions - heavy at contacts, moderate in the guard ring, and light in the active region - creating a three-dimensional optimization that simultaneously achieves narrow effective depletion width for fast response while maintaining sufficient volume in the lightly doped active region for high photon detection probability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The design achieves lower operating voltages, reduced dark count rates, enhanced photon detection probability, and minimized crosstalk, simplifying bias circuits and reducing material costs while maintaining high sensitivity and resolution.
Implementation Method 1
single-photon avalanche diodes (SPADs) have become increasingly widespread due to their high sensitivity, fast response, low power consumption, low noise, and high resolution
Implementation Method 2
single photon avalanche diode is a semiconductor device with the p-n junction operated at a reverse bias
Implementation Method 3
uses a double diffusion region to act as a guard ring for lowering the electric field at the corners of the structure and thus avoiding early breakdown on edges
Implementation Method 4
uses a buried layer as an isolation layer for reducing crosstalk
Data Source
AI summary
The present application discloses a single photon avalanche diode, which comprises a first double diffusion region and a first heavily-doped implant region, the first double diffusion region is a second conductivity type. The first heavily-doped implant region is located on the first double diffusion region and is a first conductivity type, a multiplication region is formed between the first heavily-doped implant region and the first double diffusion region. The multiplication region of the single photon avalanche diode according to the present application is formed by the first double diffusion region, which may feature characteristics of low breakdown voltage and low dark count rate.


