SPAD Multiplication Region Layout for Low Dark Count Detection

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Solution Overview

Problem

Single-photon avalanche diodes (SPADs) face high dark count rates and require elevated operating voltages due to excessive doping concentrations and narrow depletion regions, leading to high tunneling-induced carriers and early breakdowns, which complicates photon detection and increases power consumption.

Innovation Solution

A single-photon avalanche diode design incorporating a double diffusion region for forming a multiplication region with low breakdown voltage, a guard ring to reduce electric field at corners, and a buried layer for isolation to minimize crosstalk and prevent electrical shorts, allowing for lower operating voltages and increased excess bias range.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If excessive doping concentration is used in n-type well and p+ region, then the depletion region becomes extremely narrow, but the dark count rate increases due to tunneling-induced carriers

Engineering Contradiction:
Improvedepletion region width controlVSAvoiddark count rate
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent applies local quality by creating a guard ring region with different doping characteristics surrounding the active detection region. This guard ring has moderate doping concentration that differs from both the heavily doped contact regions and the lightly doped active region, thereby locally optimizing the electric field distribution to suppress tunneling effects at critical perimeter areas while maintaining narrow depletion width in the center for fast response.

Inventive Principle:
Principle #3Local quality

2Object-generated harmful factors

If the operating voltage is increased to reduce dark count rate, then the breakdown voltage must be elevated, but this necessitates operation at high voltages

Engineering Contradiction:
Improvedark count rateVSAvoidoperating voltage
Core Design Contradiction:
Object-generated harmful factorsVSUse of energy by moving object

Solution Approach 1:

The patent employs parameter changes by systematically varying the doping concentrations across different regions (heavy doping in contact regions, moderate doping in guard ring, light doping in active region) and adjusting the depletion region width through controlled oxidation processes. These parameter modifications enable the device to achieve low dark count rates at lower operating voltages by optimizing the electric field distribution and breakdown characteristics.

Inventive Principle:
Principle #35Parameter changes

3Device complexity

If excessive doping concentration is used to form the multiplication region, then the device structure is simplified, but the breakdown voltage becomes extremely narrow and leads to early breakdown on edges

Engineering Contradiction:
Improvemultiplication region structureVSAvoidbreakdown uniformity
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The patent applies segmentation by dividing the device into distinct functional regions: a central active detection region, a surrounding guard ring region with intermediate doping, and outer contact regions with heavy doping. This segmentation allows each region to be optimized independently - the active region maintains narrow depletion for fast response while the guard ring provides field management to prevent edge breakdown, thus improving reliability without excessive complexity.

Inventive Principle:
Principle #1Segmentation

4Speed

If the depletion region is made extremely narrow for fast response, then the response speed increases, but the photon detection probability decreases

Engineering Contradiction:
Improveresponse speedVSAvoidphoton detection probability
Core Design Contradiction:
SpeedVSMeasurement precision

Solution Approach 1:

The patent addresses this contradiction by transitioning from a uniform one-dimensional doping profile to a multi-dimensional graded doping structure. The doping concentration varies in multiple dimensions - heavy at contacts, moderate in the guard ring, and light in the active region - creating a three-dimensional optimization that simultaneously achieves narrow effective depletion width for fast response while maintaining sufficient volume in the lightly doped active region for high photon detection probability.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The design achieves lower operating voltages, reduced dark count rates, enhanced photon detection probability, and minimized crosstalk, simplifying bias circuits and reducing material costs while maintaining high sensitivity and resolution.

Implementation Method 1

single-photon avalanche diodes (SPADs) have become increasingly widespread due to their high sensitivity, fast response, low power consumption, low noise, and high resolution

Methodology Applied
Scientific EffectAvalanche breakdown: Avalanche Breakdown

Implementation Method 2

single photon avalanche diode is a semiconductor device with the p-n junction operated at a reverse bias

Methodology Applied
Scientific EffectPhotoelectric effect: Photoelectric Effect

Implementation Method 3

uses a double diffusion region to act as a guard ring for lowering the electric field at the corners of the structure and thus avoiding early breakdown on edges

Methodology Applied
Scientific EffectElectric field distribution: Electric Field

Implementation Method 4

uses a buried layer as an isolation layer for reducing crosstalk

Methodology Applied
Scientific EffectElectrical insulation: Electrical Resistance

Data Source

PatentUS20240243213A1Single Photon Avalanche Diode
Publication Date: 2024.07.18 SEER MICROELECTRONICS INC
  • US20240243213A1 patent drawing
  • US20240243213A1 patent drawing
  • US20240243213A1 patent drawing

AI summary

The present application discloses a single photon avalanche diode, which comprises a first double diffusion region and a first heavily-doped implant region, the first double diffusion region is a second conductivity type. The first heavily-doped implant region is located on the first double diffusion region and is a first conductivity type, a multiplication region is formed between the first heavily-doped implant region and the first double diffusion region. The multiplication region of the single photon avalanche diode according to the present application is formed by the first double diffusion region, which may feature characteristics of low breakdown voltage and low dark count rate.