SPAD Pixel Isolation Structure for Consistent Charge Arrival

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Solution Overview

Problem

Existing optical detection apparatuses with single-photon avalanche diodes (SPAD) suffer from variations in the time it takes for photocharges to reach the P-N junction, leading to low temporal resolution due to inconsistent potential gradients in the P-type semiconductor region, affecting the detection efficiency.

Innovation Solution

The apparatus incorporates a trench isolation portion with a conductor and insulator between photoelectric conversion elements, featuring specific semiconductor regions and a second conductivity type layer on the trench sidewall to manage potential gradients and facilitate faster charge movement to the avalanche multiplication region.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a P-type semiconductor region is used to isolate pixels, then pixel isolation is achieved, but potential gradient becomes inconsistent causing variation in photocharge arrival time

Engineering Contradiction:
Improvepixel isolationVSAvoidtemporal resolution
Core Design Contradiction:
ReliabilityVSMeasurement precision

Solution Approach 1:

The patent applies local quality by creating a second conductivity type layer specifically on the sidewall of the trench isolation portion, rather than uniformly modifying the entire P-type semiconductor region. This localized modification generates a targeted potential gradient in the charge collection region, ensuring consistent photocharge arrival times at the P-N junction while maintaining effective pixel isolation through the trench structure.

Inventive Principle:
Principle #3Local quality

2Reliability

If photocharges are collected in a P-type semiconductor region without potential gradient control, then charge collection is achieved, but variation in arrival time reduces detection speed

Engineering Contradiction:
Improvecharge collectionVSAvoiddetection speed
Core Design Contradiction:
ReliabilityVSSpeed

Solution Approach 1:

The patent implements preliminary action by pre-establishing a potential gradient through the second conductivity type layer on the trench sidewall before photocharges are generated. This预先 created electric field guides the movement of photocharges through the charge collection region, ensuring they reach the P-N junction in consistent time intervals and improving detection speed without compromising charge collection efficiency.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design enhances the temporal resolution of optical detection by reducing charge diffusion and ensuring consistent potential gradients, improving the speed and efficiency of signal detection.

Implementation Method 1

In each of the SPAD pixels, in a P-N junction region in a semiconductor region, a photocharge resulting from a single photon causes avalanche multiplication.

Methodology Applied
Scientific EffectAvalanche multiplication: Avalanche Breakdown

Implementation Method 2

an optical detection apparatus that performs photoelectric conversion

Methodology Applied
Scientific EffectPhotoelectric conversion: Photoelectric Effect

Data Source

PatentUS12585001B2Optical detection apparatus and optical detection system
Publication Date: 2026.03.24 CANON KK
  • US12585001B2 patent drawing
  • US12585001B2 patent drawing
  • US12585001B2 patent drawing

AI summary

An optical detection apparatus includes a trench isolation portion provided in a substrate and disposed between a plurality of photoelectric conversion elements. Each of the plurality of photoelectric conversion elements includes an avalanche diode. The avalanche diode includes a first semiconductor region of a first conductivity type, a second semiconductor region of a second conductivity type, and a third semiconductor region having an impurity concentration lower than impurity concentrations of the first and second semiconductor regions. The trench isolation portion includes a conductor and an insulator disposed between the conductor and the avalanche diode, and on a sidewall of the trench isolation portion, a second conductivity type layer is formed in which charges of the second conductivity type are accumulated, and the second conductivity type layer and the second semiconductor region are in contact with each other.