Spatial Antenna Separation for Reduced RF Exposure Computation
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Solution Overview
Problem
Conventional RF exposure compliance exemption procedures for wireless communication devices, particularly for millimeter wave (mmW) antennas, are computationally intensive and resource-heavy, leading to significant time and resource consumption.
Innovation Solution
An optimized RF exposure compliance exemption procedure is implemented, which involves computing RF exposure compliance exemption metrics for reduced RF exposure regions instead of individual beam locations, allowing for efficient antenna grouping and compliance with RF exposure limits.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional RF exposure compliance exemption procedures are used to compute metrics for all beam locations, then RF exposure compliance is ensured, but computational burden and processing time increase significantly
Solution Approach 1:
The patent segments the computation domain by identifying and focusing only on reduced RF exposure regions rather than computing metrics for all beam locations. This segmentation allows the system to divide the problem into manageable parts, computing exemption metrics only where necessary while skipping regions with already acceptable exposure levels, thereby reducing processing time while maintaining compliance reliability.
Solution Approach 2:
The patent applies local quality by treating different spatial regions differently based on their RF exposure characteristics. Regions with high RF exposure receive detailed computation and assessment, while regions with low exposure are excluded from intensive computation. This localized approach ensures compliance where needed without wasting computational resources on areas that already meet exposure limits.
2Reliability
If conventional RF exposure compliance exemption procedures are used to compute metrics for all beam locations, then RF exposure compliance is ensured, but computational resources and memory usage increase
Solution Approach 1:
The patent extracts and removes unnecessary computation tasks by identifying and excluding beam locations that do not require exemption metric computation. By taking out the redundant calculations for beams in reduced RF exposure regions, the system significantly reduces computational complexity and memory usage while preserving the essential function of ensuring RF exposure compliance through targeted assessment of only the necessary beam locations.
3Reliability
If antenna grouping is performed without optimized RF exposure compliance procedures, then comprehensive compliance assessment is achieved, but processing efficiency decreases
Solution Approach 1:
The patent performs preliminary action by pre-identifying reduced RF exposure regions and determining which beam locations require exemption metric computation before proceeding with antenna grouping. This preliminary filtering step allows the subsequent antenna grouping process to operate efficiently on a reduced dataset, maintaining comprehensive compliance assessment accuracy while significantly improving processing efficiency through optimized workflow sequencing.
Data Source
AI summary
Techniques and apparatus for radio frequency (RF) exposure with antenna grouping are described. An example method that may be performed by a computing device includes obtaining, for a wireless device's surface, RF exposure map(s) associated with beams corresponding to a first antenna. The RF exposure map(s) indicate locations on the surface that are associated with maximum RF exposure(s). An RF exposure compliance exemption procedure is performed for the first antenna and a second antenna using a region associated with the locations. The exemption procedure involves computing RF exposure compliance exemption metrics for the region. A total number of the RF exposure compliance exemption metrics is less than a total number of the locations. Antenna grouping for at least the first and second antennas is performed, based on the exemption procedure.