Interfered Spectral Peak Curve Fitting for Emission Analysis
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Solution Overview
Problem
Existing optical spectrometry methods struggle with overlapping spectral peaks due to insufficient resolution, leading to erroneous identifications and increased analysis time, and inter-element correction algorithms are often impractical or require significant user effort.
Innovation Solution
A method that generates interfered curve parameters based on a model of expected curve parameters for the optical spectrometer and detector location, fitting multiple curves to each interfered peak to accurately characterize spectral emissions, allowing for baseline correction and concentration calculation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If inter-element correction algorithm is applied to resolve overlapping peaks, then measurement precision may be improved, but device complexity and user effort increase significantly
Solution Approach 1:
The patent segments the interfered peak into multiple individual spectral peaks by fitting separate curves to each underlying emission. The curve fitting process divides the complex interfered signal into distinct components, each representing a separate spectral emission, thereby resolving the overlap without requiring complex inter-element correction algorithms
Solution Approach 2:
The patent applies baseline correction and curve parameter generation as preliminary steps before performing the actual peak identification. By pre-processing the spectral data to establish accurate baseline levels and generate initial curve parameters, the system prepares the data in advance to enable more accurate and simpler peak fitting, reducing the need for complex iterative correction algorithms
2Measurement precision
If traditional curve fitting is used for overlapping peaks, then analysis time increases and user review is required, but device complexity remains low
Solution Approach 1:
The system performs baseline correction and generates initial curve parameters automatically as preliminary steps before peak fitting. This pre-processing prepares the data in advance, enabling the curve fitting algorithm to converge faster and reducing the need for manual user review, thereby decreasing overall analysis time while maintaining accuracy
Solution Approach 2:
The patent implements automatic peak identification through curve fitting that operates without requiring user intervention. The system self-corrects for baseline effects and automatically fits curves to identify peaks, eliminating the need for manual user review of overlapping peaks and significantly reducing analysis time
Data Source
AI summary
Systems, devices, and methods of analyzing an interfered peak of a sample spectrum is disclosed. The sample spectrum may be generated using a detector of an optical spectrometer. The interfered peak may be produced by a plurality of spectral peaks of different wavelengths. The method may include generating interfered curve parameters representative of the peak shape of each spectral emission in the interfered peak based at least in part on a model of expected curve parameters for the optical spectrometer and a location of the interfered peak on the detector of the optical spectrometer; fitting a plurality of curves to the interfered peak, each curve corresponding to one of the plurality of spectral emissions of different wavelengths forming the interfered peak, wherein each curve is fitted using the interfered curve parameters provided by the model of expected peak parameters; and outputting the plurality of curves for further analysis.