Spectrometer Spatial Projection Matrix for Lithography Spectrum Estimation
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Solution Overview
Problem
Current methods for estimating the optical spectrum of light beams in semiconductor lithography, particularly in deep ultraviolet ranges, face challenges in accurately measuring spectral features like bandwidth and wavelength, which are crucial for controlling lithography properties such as minimum feature size and pattern quality.
Innovation Solution
A method and apparatus that project a light beam onto distinct spatial areas of a spectrometer, using a two-dimensional matrix to relate spatial outputs to spectral features, allowing for the estimation of the optical spectrum by detecting characteristics and performing matrix multiplication, while reducing noise impacts.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If traditional spectral measurement methods are used, then the measurement process is simple, but the measurement precision of spectral features is insufficient
Solution Approach 1:
The patent transforms spectral information from the spectral domain to the spatial domain by projecting different filtered versions of the optical spectrum onto distinct spatial areas. This dimensional transformation allows the spectrometer to capture spectral features through spatial distribution patterns, improving measurement precision while managing system complexity through mathematical reconstruction using a two-dimensional matrix.
Solution Approach 2:
The optical spectrum is segmented into different filtered versions, each projected onto a distinct spatial area. This segmentation allows parallel measurement of multiple spectral components simultaneously, enhancing measurement precision through distributed spatial encoding while reducing the complexity of sequential scanning mechanisms.
2Manufacturing precision
If spectral analysis is performed to control lithography properties, then the control accuracy improves, but the measurement time increases
Solution Approach 1:
The system uses periodic modulation of the optical spectrum through time-varying filters, where different filtered versions are projected onto spatial areas in a periodic sequence. This periodic action enables continuous spectral monitoring without requiring continuous scanning, thereby improving lithography control accuracy while minimizing measurement time through efficient temporal multiplexing.
Solution Approach 2:
A two-dimensional matrix relating spatial areas to spectral features is pre-calculated and stored before actual measurements. This preliminary action enables rapid reconstruction of spectral information from spatial measurements during production, improving both control accuracy and reducing measurement time by eliminating the need for real-time complex calculations.
3Loss of information
If the light beam is projected onto distinct spatial areas with different filtered versions, then the spectral information is enhanced, but the device complexity increases
Solution Approach 1:
The spectrometer system uses a universal two-dimensional matrix that can reconstruct any spectral information from spatial measurements. This universal approach allows a single spectrometer configuration to handle various spectral analysis tasks without requiring multiple specialized components, thereby enhancing spectral information completeness while managing device complexity through a unified mathematical framework.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables accurate estimation of optical spectra, improving the control of lithography properties by precisely measuring spectral features, thereby enhancing the quality of patterned wafers.
Implementation Method 1
projecting the light beam onto distinct spatial areas of a spectrometer, wherein each spatial area receives a different filtered version of the optical spectrum
Implementation Method 2
detecting a characteristic of the projected light beam at each of the distinct spatial areas of the spectrometer
Data Source
AI summary
A method is performed for estimating the optical spectrum of a light beam. The method includes: projecting the light beam onto distinct spatial areas of a spectrometer, wherein each spatial area receives a different filtered version of the optical spectrum; detecting a characteristic of the projected light beam at each of the distinct spatial areas of the spectrometer; receiving a two-dimensional matrix in which each entry of the matrix provides a relationship between one or more spatial areas and each spectral feature, wherein the two-dimensional matrix is related to the input-output relationship of the spectrometer; and estimating the optical spectrum of the light beam based on an analysis that uses both the detected light beam characteristics and the received two-dimensional matrix.