Spectroscopic Ellipsometer Line Slit Assembly for Large-Area Analysis

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Solution Overview

Problem

Existing semiconductor fabrication processes face challenges in efficiently performing large-area analysis and determining structural parameters of substrates due to increased integration, which complicates process evaluation and failure detection.

Innovation Solution

A spectroscopic ellipsometer equipped with a line slit assembly and a substrate analysis method that allows for obtaining spectral data, determining Fourier coefficients, and analyzing continuous polarization signals of substrate line regions, enabling easy large-area analysis by using a rotary spectroscope and a line slit assembly to extract and disperse light for detection.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If a conventional point slit assembly is used in the spectroscope, then the device complexity is low, but the analysis area is limited and large-area analysis cannot be performed efficiently

Engineering Contradiction:
Improveanalysis areaVSAvoidslit assembly complexity
Core Design Contradiction:
Area of stationary objectVSDevice complexity

Solution Approach 1:

The slit assembly is divided into multiple independent slits (first slit, second slit, third slit, fourth slit) arranged in a specific pattern. Each slit can independently define a measurement region on the substrate, enabling simultaneous analysis of multiple areas. This segmentation allows the system to achieve large-area analysis capability while maintaining manageable device complexity through modular slit design.

Inventive Principle:
Principle #1Segmentation

2Area of stationary object

If spectral data is collected from the entire substrate surface, then the coverage is complete, but the analysis time increases significantly

Engineering Contradiction:
Improvesubstrate coverageVSAvoidanalysis time
Core Design Contradiction:
Area of stationary objectVSLoss of time

Solution Approach 1:

Instead of collecting spectral data from the entire substrate surface uniformly, the invention uses selectively positioned slits to measure only specific regions of interest. The slits are configured to target critical areas where defects are most likely to occur or where process parameters need verification. This partial measurement approach achieves sufficient substrate coverage for quality control while dramatically reducing analysis time compared to full-surface scanning.

Inventive Principle:
Principle #16Partial or excessive action

3Measurement precision

If multiple measurement points are analyzed sequentially, then the measurement precision is maintained, but the productivity decreases

Engineering Contradiction:
Improvestructural parameter precisionVSAvoidanalysis throughput
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The invention merges multiple measurement functions into a single spectral measurement by using multiple slits that simultaneously define multiple measurement regions. The spectroscope captures spectral data from all slit-defined regions in one measurement cycle, and the system then separates and analyzes the data from each region individually. This combining approach maintains measurement precision for each region while achieving high productivity through simultaneous data collection.

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables rapid and accurate determination of structural parameters and failure detection in semiconductor substrates, improving process evaluation efficiency and reducing analysis time by allowing simultaneous analysis of straight line regions.

Implementation Method 1

a spectral dispersion device configured to disperse the light from the line slit assembly

Methodology Applied
Scientific EffectSpectral dispersion: Diffraction

Implementation Method 2

a polarizer configured to polarize the light emitted from the light source

Methodology Applied
Scientific EffectPolarization: Polarisation

Implementation Method 3

a rotatable analyzer configured to determine a degree of polarization of the light from the polarizer and a position of a polarization plane

Methodology Applied
Scientific EffectPolarization analysis: Polarisation

Data Source

PatentUS20250224326A1Spectroscopic ellipsometer and substrate analysis method using the same
Publication Date: 2025.07.10 SAMSUNG ELECTRONICS CO LTD
  • US20250224326A1 patent drawing
  • US20250224326A1 patent drawing
  • US20250224326A1 patent drawing

AI summary

A spectroscopic ellipsometer includes a light source configured to emit light, a polarizer configured to polarize the light emitted from the light source, a substrate support supporting a substrate, a polarization analysis assembly that is rotatable and optically connected to the substrate support, and a spectroscope configured to disperse the light from the polarization analysis assembly, where the spectroscope includes a lens configured to change a propagation path of the light from the polarization analysis assembly, a line slit assembly including a slit extending linearly and configured to extract a portion of the light from the lens, a spectral dispersion device configured to disperse the light from the line slit assembly, and a plane detector optically connected to the spectral dispersion device and configured to continuously detect the dispersed light that is dispersed by the spectral dispersion device.