Spherical Cerium Oxide Abrasive for Scratch-Free Polishing

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Solution Overview

Problem

Current cerium oxide abrasive materials used for polishing glass optical elements and semiconductor devices have irregular surfaces, leading to scratches and reduced productivity due to their non-spherical shape and insufficient polishing rate, despite efforts to increase trivalent cerium content for enhanced polishing performance.

Innovation Solution

Development of cerium oxide abrasive materials with spherical cerium oxide particles produced using an aqueous solution of a rare earth element salt and a precipitant, with controlled aspect ratio, trivalent cerium content, and firing conditions to achieve high polishing performance and surface smoothness.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If cerium oxide abrasive particles are prepared by a pulverization process to increase polishing rate, then the polishing rate is improved, but the particles have sharply edged surfaces that scratch workpiece surfaces

Engineering Contradiction:
Improvepolishing rateVSAvoidsurface scratches
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The patent applies spheroidality by preparing cerium oxide abrasive particles with a spherical shape through a controlled precipitation process rather than pulverization. The spherical morphology eliminates sharp edges that cause scratching, while maintaining high polishing rate through optimized particle composition and surface properties.

Inventive Principle:
Principle #14Spheroidality (Curvature)

2Manufacturing precision

If a multi-stage polishing process is used with colloidal silica to improve surface smoothness, then the surface roughness is reduced, but the productivity is reduced

Engineering Contradiction:
Improvesurface smoothnessVSAvoidpolishing productivity
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The patent merges the functions of primary polishing (high polishing rate) and secondary polishing (surface smoothness) into a single stage by developing spherical cerium oxide particles that simultaneously provide high material removal rate and low scratching tendency, eliminating the need for separate colloidal silica polishing step.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The patent changes the particle morphology parameter from irregular/pulverized shape to spherical shape, and optimizes the particle size distribution and composition parameters to achieve both high polishing rate and surface smoothness in a single polishing process.

Inventive Principle:
Principle #35Parameter changes

3Shape

If other rare earth elements are added to adjust particle shape and size distribution, then the particle morphology is improved, but the cerium concentration on particle surfaces is reduced

Engineering Contradiction:
Improveparticle shape and size distributionVSAvoidcerium concentration on particle surface
Core Design Contradiction:
ShapeVSQuantity of substance

Solution Approach 1:

The patent extracts and removes other rare earth elements from the particle composition, using only cerium oxide to maintain high cerium concentration on the particle surface. The spherical shape and controlled size distribution are achieved through precipitation process parameters rather than compositional modification.

Inventive Principle:
Principle #2Taking out (Extraction)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The resulting cerium oxide abrasive material achieves high polishing rates and surface smoothness with reduced scratches, improving productivity and maintaining high sphericity, thereby addressing the limitations of traditional cerium oxide abrasive materials.

Implementation Method 1

adding an aqueous solution of a precipitant to an aqueous solution of a salt of a rare earth element and heating the solution with stirring to prepare a precursor of abrasive particles

Methodology Applied
Scientific EffectPrecipitation: Precipitation

Implementation Method 2

firing the precursor to form cerium oxide abrasive particles

Methodology Applied
Scientific EffectFiring: Sintering

Data Source

PatentUS10047262B2Cerium oxide abrasive, method for producing cerium oxide abrasive, and polishing method
Publication Date: 2018.08.14 KONICA MINOLTA INC
  • US10047262B2 patent drawing
  • US10047262B2 patent drawing
  • US10047262B2 patent drawing

AI summary

An object of the present invention is to provide a cerium oxide abrasive material containing cerium oxide abrasive particles prepared by a synthetic method using an aqueous solution of a salt of a rare earth element and a precipitant, the cerium oxide abrasive particles having a spherical shape and high polishing performance (polishing rate and polishing precision of the polished surface), a method for producing the cerium oxide abrasive material, and a polishing method. The cerium oxide abrasive material according to the present invention comprises spherical cerium oxide abrasive particles prepared by a synthetic method using an aqueous solution of a salt of a rare earth element and a precipitant, wherein the cerium oxide abrasive particles have a spherical shape having an average aspect ratio within the range of 1.00 to 1.15.