Spheroidized Silica Powder for Gas Bubble Control
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Solution Overview
Problem
Synthetic silica glass products manufactured from conventional synthetic amorphous silica powders exhibit significant gas bubble generation or expansion when used in high temperature and reduced pressure environments, leading to performance deterioration in applications like silicon single crystal pulling.
Innovation Solution
A synthetic amorphous silica powder is produced through a process involving spheroidizing treatment of granulated silica powder, followed by cleaning and drying, to achieve specific properties such as a controlled average particle diameter, reduced porosity, and low impurity concentrations, thereby minimizing gas components and bubble formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional synthetic amorphous silica powder is used as raw material, then high purity is achieved, but gas bubble generation occurs in high temperature and reduced pressure environment
Solution Approach 1:
The patent applies spheroidizing treatment to change the particle shape parameter from irregular to spherical, and controls the porosity parameter to be 0.03 or less. These parameter changes eliminate gas pockets within particles while maintaining high purity, thereby preventing gas bubble generation during semiconductor manufacturing processes.
Solution Approach 2:
The patent replaces conventional irregular particle morphology with spheroidized particles through mechanical treatment. This substitution of particle shape structure reduces internal stress concentration and eliminates micropores that would otherwise generate gas bubbles under high temperature and reduced pressure conditions.
2Object-affected harmful factors
If spheroidizing treatment is applied to granulated silica powder, then gas bubble generation is reduced, but manufacturing process complexity increases
Solution Approach 1:
The spheroidizing treatment is performed as a preliminary action on granulated silica powder before the powder is used as raw material. By pre-spheroidizing the particles and controlling porosity to 0.03 or less in advance, the patent eliminates gas bubble generation potential before the semiconductor manufacturing process begins, simplifying the overall process despite the added treatment step.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resulting silica powder significantly reduces gas bubble generation and expansion, enhancing the performance and quality of synthetic silica glass products in high temperature and reduced pressure environments.
Implementation Method 1
applying a spheroidizing treatment to granulated silica powder
Implementation Method 2
cleaning and drying it so that the synthetic amorphous silica powder has an average particle diameter D50 of 10 to 2,000 μm
Data Source
AI summary
The synthetic amorphous silica powder of the present invention is characterized in that it comprises a synthetic amorphous silica powder obtained by applying a spheroidizing treatment to a silica powder, and by subsequently cleaning and drying it so that the synthetic amorphous silica powder has an average particle diameter D50 of 10 to 2,000 μm; wherein the synthetic amorphous silica powder has: a quotient of 1.00 to 1.35 obtained by dividing a BET specific surface area of the powder by a theoretical specific surface area calculated from the average particle diameter D50; a real density of 2.10 to 2.20 g/cm3; an intra-particulate porosity of 0 to 0.05; a circularity of 0.75 to 1.00; and a spheroidization ratio of 0.55 to 1.00.