Spin Chuck Bowl Flow Passage for Self-Cleaning Rinse Delivery

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Solution Overview

Problem

The existing substrate treating apparatuses require manual cleaning of the bowl, which is time-consuming and increases maintenance time, and the bowl contamination is a significant issue due to the adherence of photoresist, leading to inefficiencies in the manufacturing process.

Innovation Solution

The substrate treating apparatus incorporates a bowl member with an inclined surface and a flow passage design that facilitates self-cleaning by directing rinse liquid through a curved passage to efficiently remove contaminants, including a rinse liquid supply unit and a fan filter unit to enhance airflow and liquid distribution.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If the bowl is manually separated and cleaned by a worker, then the bowl can be cleaned, but it consumes a lot of time and increases maintenance time

Engineering Contradiction:
Improvecleaning capabilityVSAvoidmaintenance time
Core Design Contradiction:
Ease of manufactureVSLoss of time

Solution Approach 1:

The bowl is designed with self-cleaning functionality through integrated rinse liquid supply passages and airflow passages. The rinse liquid flows through the bowl's interior surfaces and evaporates, while airflow assists in removing contaminants, enabling the bowl to clean itself without manual intervention and reducing maintenance time

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The system uses hydraulic principles by supplying rinse liquid through dedicated passages that contact all interior surfaces of the bowl. The liquid flow, combined with airflow from the fan filter unit, creates a self-cleaning mechanism that eliminates the need for manual separation and cleaning operations

Inventive Principle:
Principle #29Pneumatics and hydraulics

2Productivity

If the bowl is left in the liquid treating chamber, then the chamber remains ready for operation, but the bowl becomes contaminated by photoresist

Engineering Contradiction:
Improveprocess continuityVSAvoidbowl contamination
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The self-cleaning mechanism performs preliminary cleaning actions during or after the applying process. Rinse liquid is supplied to prevent photoresist adhesion, and airflow continuously removes contaminants before they can accumulate, keeping the bowl clean without requiring removal from the chamber

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The bowl automatically cleans itself through integrated rinse liquid supply and airflow systems that activate during the process. This self-service capability prevents contamination while maintaining process continuity, as the bowl remains in the chamber and cleans itself without external intervention

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design reduces bowl contamination and maintenance time by enabling effective self-cleaning of the bowl, improving process efficiency and reducing the need for manual intervention.

Implementation Method 1

a first bowl including an inclined surface inclined downward in an outward direction

Methodology Applied
Scientific EffectGravity: Gravitation

Implementation Method 2

a space between an upper surface of the first bowl and a lower surface of the upper base forms a first flow passage and at least a portion of the first flow passage is formed in an arc shape along the upper surface of the first bowl, and rinse liquid is supplied toward the inclined surface of the first bowl through the first flow passage

Methodology Applied
Scientific EffectFluid flow:

Implementation Method 3

a fan filter unit forming airflow in a downward direction above the spin chuck

Methodology Applied
Scientific EffectAirflow generation: Fan

Data Source

PatentUS12563995B2Substrate treating apparatus
Publication Date: 2026.02.24 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US12563995B2 patent drawing
  • US12563995B2 patent drawing
  • US12563995B2 patent drawing

AI summary

A substrate treating apparatus includes: a spin chuck supporting a substrate; a rinse liquid supply unit supplying a rinse liquid; and a bowl member surrounding the spin chuck, wherein the bowl member includes: a first bowl including an inclined surface inclined downward in an outward direction and having an upper surface of which at least a portion has a curvature; and an upper base disposed on the first bowl, a space between the upper surface of the first bowl and a lower surface of the upper base forms a first flow passage and at least a portion of the first flow passage is formed in an arc shape along the upper surface of the first bowl, and the rinse liquid is supplied toward the inclined surface of the first bowl through the first flow passage.