Spin Coating Base Plate Assembly for Substrate Edge Cleaning
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Solution Overview
Problem
Spin coating devices face challenges in effectively cleaning the bottom surface and edges of substrate materials due to chemical and particle contamination from separate dispense arms, which lack a controlled environment.
Innovation Solution
A system and method for a spin coating device that includes a base plate assembly with locking pins and a cleaning nozzle, allowing for optimal exposure of the bottom surface and edges by synchronizing the spinning of the base plate with the spin chuck, then disengaging to lower the base plate and expose the nozzle for cleaning, eliminating the need for external dispense arms.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If separate dispense arms are used to clean the bottom surface and edges of the substrate, then cleaning function is provided, but chemical and particle contamination occurs on the coated substrate material
Solution Approach 1:
The cleaning function is merged with the spin chuck assembly by integrating a cleaning nozzle directly into the base plate structure. The base plate serves dual purposes: supporting the spin chuck during coating operations and housing the cleaning nozzle for bottom surface and edge cleaning. This eliminates the need for separate dispense arms and prevents contamination from external cleaning mechanisms.
Solution Approach 2:
The base plate acts as an intermediary structure that mediates between the spin chuck and the cleaning nozzle. It provides a controlled environment by containing the cleaning mechanism within its structure, allowing cleaning to occur without exposure to external contaminants that would be present if separate dispense arms were used.
2Reliability
If the cleaning nozzle is positioned below the base plate, then it is protected during spinning, but it is not optimally exposed to the bottom surface and edges of the substrate for cleaning
Solution Approach 1:
The base plate is designed with dynamic vertical movement capability, allowing it to transition between an upper position during spinning (where the cleaning nozzle is protected below the base plate) and a lower position during cleaning (where the cleaning nozzle emerges to optimally expose the bottom surface and edges). This dynamic positioning resolves the contradiction between protection and cleaning effectiveness.
Solution Approach 2:
The system performs preliminary positioning of the base plate to the lower position before cleaning operation begins, ensuring the cleaning nozzle is pre-positioned for optimal exposure. The base plate is lowered in advance to prepare the cleaning nozzle for effective cleaning of the bottom surface and edges.
3Stability of the object's composition
If the base plate synchronously spins with the spin chuck, then a controlled low turbulence environment is created for film distribution, but the cleaning nozzle must be disengaged and repositioned for cleaning operation
Solution Approach 1:
The system is segmented into distinct operational phases: a coating phase where the base plate synchronously spins with the spin chuck to create a low turbulence environment, and a cleaning phase where the base plate is disengaged and lowered to allow cleaning nozzle operation. The locking pins and key slots mechanism enables clean segmentation between these phases, resolving the contradiction between maintaining stable spinning conditions and enabling cleaning access.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach prevents chemical and particle contamination while providing a controlled environment for cleaning, reducing defects and turbulence, and optimizing the use of cleaning solvents.
Implementation Method 1
The spinning of the spin chuck along with the substrate material may distribute the film-forming substance uniformly across the top surface of the substrate material
Implementation Method 2
instructions to clean the bottom surface of the substrate material and/or the edges thereof utilizing the cleaning nozzle based on the optimal exposure
Data Source
AI summary
A non-transitory medium includes instructions to control a spin coating device to render a cleaning nozzle of the spin coating device below a base plate and out of optimal exposure to a substrate material placed on a spin chuck when the base plate is engaged with the spin chuck. In response to disengagement of a lid from the base plate, the non-transitory medium also includes instructions to disengage the base plate from the spin chuck to lower the base plate to a locking point whereupon a portion of the cleaning nozzle below the base plate passes through a hole in the base plate and emerges completely out of and above the base plate, and instructions to clean the bottom surface and/or the edges of the substrate material utilizing the cleaning nozzle based on an optimal exposure to the bottom surface and the edges of the substrate material.