Spin Coating Film Control Using Edge Imaging Feedback
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Solution Overview
Problem
The existing coating processes for semiconductor devices face challenges in enhancing the fluidity of chemical liquids on substrates, leading to coating failures due to insufficient solvent distribution, resulting in inefficient use of chemicals and potential defects.
Innovation Solution
A coating processing apparatus that includes a rotary table, chemical liquid nozzles, and imaging devices to control the rotation speed and discharge positions of coating liquids, ensuring the distance between the liquid film edges falls within a predetermined range, thereby improving fluidity and reducing chemical consumption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If rotation speed is increased to spread chemical liquid evenly, then coating uniformity is improved, but chemical liquid may be discharged to the outside of the substrate increasing consumption
Solution Approach 1:
The patent changes the parameter of rotation speed to an optimal range that balances coating uniformity and chemical liquid retention. By controlling the rotation speed within specific parameters, the chemical liquid spreads evenly across the substrate without being discharged to the outside, thus maintaining manufacturing precision while reducing substance loss
Solution Approach 2:
The patent uses an imaging device to monitor the spreading of chemical liquid and provides feedback to the control device. This feedback mechanism allows real-time adjustment of rotation speed to maintain optimal conditions, ensuring uniform coating while preventing excessive discharge of chemical liquid
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively enhances the fluidity of chemicals on the substrate's periphery, reducing the likelihood of coating failures and minimizing chemical waste, while allowing for precise control to maintain optimal processing conditions.
Implementation Method 1
The chemical liquid supplied to the vicinity of the center of the substrate is spread on the substrate by rotation
Data Source
AI summary
According to one embodiment, a coating processing apparatus includes a rotary table being rotatable while holding a substrate on which a coating film is to be formed; a first discharge part discharging a first coating liquid to a first discharge position that is a central portion of the substrate to form a first liquid film; a second discharge part discharging a second coating liquid to a second discharge position outside the first discharge position of the substrate to form a second liquid film; an imaging device configured to image contours of the first and second liquid films spreading outside the substrate by rotation of the substrate; and a control device configured to control at least one of a rotation speed of the substrate and the second discharge position based on an imaging result by the imaging device so that a distance between the contours falls within a predetermined range.