Spin Coating Apparatus Laser Viscosity Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The spin coating method faces challenges in achieving uniform thickness of the photoresist film across a large substrate area, with issues of uneven thickness distribution due to varying rotation speeds and difficulties in spreading the coating material effectively.
Innovation Solution
A spin coating apparatus and method that incorporates a laser supply unit moving horizontally above the substrate, adjusting its speed and intensity to control the coating material's viscosity and spread, ensuring uniform thickness across different regions of the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If the rotation speed of the substrate supporter is increased to spread the photoresist solution widely, then the coating area is improved, but the thickness uniformity deteriorates (thicker at outer part than center)
Solution Approach 1:
The patent applies local quality by introducing a laser supply unit that can independently adjust laser intensity and moving speed at different radial positions on the substrate. The control unit modifies laser parameters locally according to the specific region (center, middle, or outer area), allowing differential treatment of different substrate zones to achieve uniform thickness across the entire coating area.
2Manufacturing precision
If the rotation speed is decreased to improve thickness uniformity, then the thickness distribution is improved, but the coating area coverage deteriorates (cannot spread widely)
Solution Approach 1:
The patent employs parameter changes by dynamically adjusting both the rotation speed of the substrate supporter and the laser supply parameters (intensity and moving speed) based on the radial position. The control unit receives position information and modifies operational parameters in real-time, enabling the system to maintain optimal coating conditions across different regions and achieve both wide coverage and uniform thickness.
3Manufacturing precision
If additional measures are taken to achieve uniform thickness over large area, then the coating quality is improved, but the device complexity increases
Solution Approach 1:
The patent implements universality by designing a control unit that integrates multiple functions: it receives position information from sensors, determines the current radial region, adjusts laser supply parameters accordingly, and coordinates with the rotation speed control. This single control unit handles all parameter adjustments for different substrate regions, avoiding the need for separate complex mechanisms for each function and reducing overall device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The described solution enables the deposition of a coating material with uniform thickness over a large substrate area without increasing the amount of coating material used, thereby improving the accuracy and efficiency of the photolithography process.
Implementation Method 1
The spin coating method spreads a photoresist solution on the substrate by using a centrifugal force caused by a rotation of a substrate supporter
Implementation Method 2
supplying a laser to the coating material from a laser supply unit, and moving the laser supply unit above the substrate supporter along a first direction
Data Source
AI summary
A spin coating apparatus according to an embodiment includes a substrate supporter supporting a substrate, a substrate supporter driver rotating the substrate supporter, a laser supply unit disposed on the substrate supporter and providing a laser, and a laser driver of driving the laser supply unit, wherein the laser supply unit may move along a first direction, which is horizontal to the substrate surface on the substrate supporter.