Multi-Frequency Spiral Electrode Layout for Uniform Plasma Profiles
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Solution Overview
Problem
Existing plasma processing apparatuses struggle to achieve a desired plasma profile and generation position consistently across different processing types and gas types, leading to defects and non-uniform processing results.
Innovation Solution
A plasma processing apparatus with a spiral-shaped outer electrode and a power splitter that applies alternating-current power at different frequencies to multiple electrodes, allowing control over plasma generation space and electron density, enabling uniform plasma processing across various conditions and gases.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a single spiral-shaped antenna structure is used, then the device configuration is simple, but it cannot achieve desired plasma profiles for different processing steps and gas types
Solution Approach 1:
The single spiral-shaped antenna is divided into three separate spiral-shaped electrodes (first, second, and third electrodes) arranged concentrically. Each electrode can be independently controlled by separate power sources, allowing independent adjustment of plasma profiles for different processing steps and gas types, thereby achieving versatility without requiring a completely new design
2Reliability
If the plasma generation profile is optimized for one gas type, then processing quality is high for that gas, but plasma conditions deteriorate when switching to other gas types
Solution Approach 1:
The system employs dynamic control of plasma generation by independently adjusting the power and frequency applied to each of the three electrodes based on the specific gas type and processing requirements. This allows the plasma profile to be dynamically optimized for each gas type (SF6, CF4, C4F8) while maintaining consistent processing quality across different gases
3Adaptability or versatility
If the plasma generation position is fixed, then the device operation is simple, but it cannot achieve desired plasma positions for different processing requirements
Solution Approach 1:
Different regions of the plasma generation space are controlled by different electrodes. The first electrode (innermost) controls the central region, the second electrode (middle) controls the intermediate region, and the third electrode (outermost) controls the peripheral region. This localized control allows independent adjustment of plasma generation position in different spatial zones, achieving versatile position control through a structured electrode arrangement
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves uniform plasma processing by controlling plasma distribution and electron density, ensuring consistent processing quality across multiple steps and gas types without structural changes, maintaining in-plane uniformity and plasma characteristics.
Implementation Method 1
a first high-frequency power source configured to apply alternating-current power having a first frequency λ1 to the first electrode and the second electrode
Implementation Method 2
a second high-frequency power source configured to apply alternating-current power having a second frequency λ2 to the third electrode
Implementation Method 3
a power splitter configured to split the alternating-current power to be applied to the first electrode and the second electrode, into the first electrode and the second electrode
Data Source
AI summary
A plasma processing apparatus according to the invention includes a chamber, an inner electrode, an outer electrode, a plasma generating power source, and a gas introduction part. The plasma generating power source applies alternating-current power to the outer electrode. The outer electrode includes a first electrode, a second electrode, and a third electrode. The plasma generating power source includes a first high-frequency power source, a second high-frequency power source, and a power splitter. The first high-frequency power source applies alternating-current power having a first frequency λ1 to the first electrode and the second electrode. The second high-frequency power source applies alternating-current power having a second frequency λ2 to the third electrode. A relationship of λ1>λ2 is satisfied. The power splitter is configured to split the alternating-current power into the first electrode and the second electrode with a predetermined split ratio.