Spiral Runner Feed-Through for CVD Gas Delivery
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Solution Overview
Problem
Existing thin-film deposition techniques for semiconductor substrates face challenges in efficiently introducing and managing precursor gases within reaction chambers to prevent unwanted deposition on reactor surfaces, leading to inefficiencies in chemical vapor deposition processes.
Innovation Solution
A feed-through apparatus is designed with a rotatable feed-through device and spiral runners to manage gases, utilizing ferro-fluidic seals and a spinner device for uniform gas distribution, ensuring gases mix only at the substrate, preventing premature reaction within the reactor.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If precursor gases are introduced close to the substrate surface to minimize unwanted deposition, then deposition precision is improved, but gas flow control complexity increases
Solution Approach 1:
The gas delivery system is segmented into multiple independent runner units, each with its own fluid inlet and elongated spiral runner. This segmentation allows precise control of gas flow to specific locations near the substrate surface, improving deposition precision while managing complexity through modular design.
Solution Approach 2:
The gas delivery mechanism transitions from a planar configuration to a three-dimensional spiral runner structure that extends along the runner unit. This dimensional change enables gas introduction at multiple positions close to the substrate surface, achieving precise deposition control.
2Productivity
If carrier gases are used to move precursor gases towards the substrate, then deposition efficiency is improved, but unwanted deposition on reactor surfaces may occur
Solution Approach 1:
The spiral runners are designed to deliver carrier gases and precursor gases to specific localized regions near the substrate surface rather than distributing them uniformly throughout the reactor. This localized gas delivery ensures efficient transport to the substrate while minimizing exposure and unwanted deposition on other reactor surfaces.
Solution Approach 2:
The elongated spiral runners act as intermediaries that guide and control the flow of carrier gases and precursor gases. These runners mediate between the gas sources and the substrate, ensuring gases reach the intended location efficiently while preventing premature reaction or unwanted deposition elsewhere in the reactor.
3Productivity
If multiple precursor gases are introduced close to each other to enable chemical reaction, then deposition rate is improved, but premature reaction within the reactor may occur
Solution Approach 1:
The system prepares and transports multiple precursor gases through separate spiral runners to predetermined positions near the substrate surface before they are intended to react. This preliminary positioning ensures that gases are ready for reaction at the correct location and time, improving deposition rate while preventing premature reaction during transport through the controlled spiral runner geometry.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enhances the uniformity and efficiency of thin-film deposition by minimizing gas pressure variations and preventing gas mixing during transport, resulting in improved film uniformity and reduced unwanted deposition on reactor surfaces.
Implementation Method 1
the elongated runner extends spirally on a surface of the runner unit
Implementation Method 2
a feed-through device rotatable with respect to the plurality of runner units
Data Source
AI summary
A feed-through apparatus for a chemical vapor deposition device including: a feed-through main body; a plurality of runner units; and a feed-through device rotatable with respect to the plurality of runner units within the feed-through main body. Each runner unit has a fluid inlet and an elongated runner for receiving the fluid from the fluid inlet wherein the elongated runner extends spirally on a surface of the runner unit. The feed-through device has a plurality of feed-through device orifices for receiving fluids from corresponding elongated runners during rotation of the feed-through device and has outlet-orifices for releasing the fluids into a reactor chamber.