Splayed Dual Robot End Effectors for Clean Substrate Transfer
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Solution Overview
Problem
Existing dual-bladed SCARA robots in electronic device manufacturing are susceptible to particle contamination during substrate transfer due to components of the upper arm assembly passing over the lower substrate, which can lead to defects in semiconductor devices.
Innovation Solution
A dual-blade robot configuration where the upper arm assembly components do not pass over the lower substrate, with the first and second arm assemblies having non-overlapping paths to minimize contamination risk, ensuring that substrates are transferred with reduced likelihood of particle contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If dual-blade robot configuration is used to increase substrate transfer efficiency, then productivity is improved, but particle contamination risk increases due to upper arm components passing over lower substrate
Solution Approach 1:
The patent applies dimensional separation by configuring the first and second arm assemblies to operate in different spatial planes or trajectories. The arm assemblies are positioned and controlled such that their movement paths do not overlap vertically or horizontally, creating dimensional separation that prevents contamination while maintaining dual-blade productivity benefits
Solution Approach 2:
The robot system is segmented into two independent arm assemblies, each with its own controlled path. This segmentation allows independent optimization of each arm's trajectory to avoid contamination zones while maintaining efficient substrate transfer operations
2Manufacturing precision
If arm assemblies are configured with non-overlapping paths to reduce contamination, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
The patent employs asymmetric configuration of the two arm assemblies, where the first and second arms have different path geometries and spatial orientations. This asymmetric design naturally prevents path overlap and contamination while maintaining manageable system complexity through deliberate geometric differentiation
Data Source
AI summary
A method of transporting substrates within an electronic device processing system includes rotating a first upper arm of a first arm assembly of a robot. The rotating causes a first end effector of the first arm assembly to move along a first path. The first arm assembly includes the first upper arm, a first forearm, a first wrist member, and the first end effector configured to support a first substrate. The method further includes rotating a second upper arm of a second arm assembly of the robot. The rotating causes a second end effector of the second arm assembly to move along a second path. The second arm assembly includes the second upper arm, a second forearm, a second wrist member, and the second end effector configured to support a second substrate. The second substrate does not overlap with the first substrate in any operating position of the end effectors.