Spliced Mask With Variable Width Strips for Alignment Compensation

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Solution Overview

Problem

The challenge in producing large-sized display or touch display panels is the difficulty in manufacturing and using large-sized masks, which are costly and inconvenient, leading to the need for splicing exposure processes that result in mura phenomena due to alignment deviations during the exposure process.

Innovation Solution

A mask with light blocking strips arranged in a mesh shape, featuring first and second light blocking strips of varying widths, is used in a splicing exposure process to align and expose substrates, where the width difference compensates for position deviations, ensuring consistent line widths across the substrate.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If a large-sized mask is used to produce large-sized display panels, then the production capability is improved, but the manufacturing cost and operational convenience deteriorate

Engineering Contradiction:
Improveproduction capabilityVSAvoidmanufacturing cost
Core Design Contradiction:
ProductivityVSEase of manufacture

Solution Approach 1:

The patent divides the large-sized mask into multiple smaller mask substrates that can be spliced together. Each mask substrate contains a portion of the light blocking strips and spaces, allowing the complete pattern to be formed by combining multiple smaller, more manageable mask substrates. This segmentation reduces manufacturing difficulty and cost while maintaining the capability to produce large-sized display panels.

Inventive Principle:
Principle #1Segmentation

2Ease of manufacture

If a splicing exposure process is used to avoid large mask manufacturing issues, then the ease of manufacture is improved, but alignment precision deteriorates due to position deviations

Engineering Contradiction:
Improveease of manufactureVSAvoidalignment precision
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent applies different width specifications to different light blocking strips based on their location. Light blocking strips at the edges of mask substrates (first light blocking strips) have a greater width than those in the interior (second light blocking strips). This local differentiation compensates for alignment deviations that occur during splicing, as the wider edge strips overlap more with adjacent substrates, ensuring consistent line widths across the entire exposed pattern despite position deviations.

Inventive Principle:
Principle #3Local quality

3Device complexity

If standard width light blocking strips are used in splicing exposure, then the manufacturing simplicity is improved, but line width consistency deteriorates due to alignment deviations

Engineering Contradiction:
Improvemanufacturing simplicityVSAvoidline width consistency
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The patent introduces asymmetry in the light blocking strip widths at the boundaries of mask substrates. The first light blocking strips at the edges have a greater width than the second light blocking strips in the interior. This asymmetric design ensures that when multiple mask substrates are spliced together, the overlapping regions maintain consistent line widths in the final exposed pattern, compensating for alignment deviations without requiring complex adjustment mechanisms.

Inventive Principle:
Principle #4Asymmetry

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach alleviates or eliminates the mura phenomenon by maintaining consistent line widths and transmittance across the display panel, improving the stripe eliminating effect and reducing alignment errors, thus enhancing the quality of large-sized touch display panels.

Implementation Method 1

a plurality of light blocking strips configured to block a light and bounding spaces through which a light is allowed to pass

Methodology Applied
Scientific EffectPhotoelectric Effect: Photoelectric Effect

Data Source

PatentUS11169438B2Mask, exposure method and touch display panel
Publication Date: 2021.11.09 HEFEI XINSHENG OPTOELECTRONICS TECH CO LTD
  • US11169438B2 patent drawing
  • US11169438B2 patent drawing
  • US11169438B2 patent drawing

AI summary

A mask is provided. The mask includes a plurality of light blocking strips configured to block light and bounding spaces through which light is allowed to pass. The plurality of light blocking strips are arranged in a mesh shape, and include first light blocking strips located in at least one side edge of the mask, and second light blocking strips, and each of the first light blocking strips has a greater width than each of the second light blocking strips. An exposure method using the mask, and a touch display panel manufactured by the exposure method are also provided.