Split Baffle Purge Ring for UV Thermal Processing

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Solution Overview

Problem

Current purge rings in UV thermal processing systems are inefficient in preventing porogen accumulation on windows and other surfaces, leading to reduced UV light transmission and requiring lengthy cleaning procedures that decrease system throughput and increase gas consumption.

Innovation Solution

The introduction of a purge ring with split baffles that separate paths for purge and cleaning gases, allowing for reduced recombination of remote plasma cleaning species and improved cleaning efficiency by maintaining necessary flow characteristics for long batches without restricting the path of cleaning gas species.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If a purge ring with a single baffle is used, then the structure is simple, but porogen accumulation on windows occurs and UV light transmission is reduced

Engineering Contradiction:

Improvepurge ring structureVSAvoidUV light transmission

Core Design Contradiction:

Device complexityVSReliability

Solution Approach 1:

The single baffle is divided into multiple baffles (first baffle and second baffle) that are positioned at different angular locations around the chamber. This segmentation allows each baffle to handle specific flow paths, preventing porogen accumulation on the window while maintaining simple individual baffle structures.

Inventive Principle:

Principle #1Segmentation

2Reliability

If purge gas flow is increased to prevent porogen accumulation, then cleaning effectiveness improves, but gas consumption increases

Engineering Contradiction:

Improvecleaning effectivenessVSAvoidgas consumption

Core Design Contradiction:

ReliabilityVSLoss of substance

Solution Approach 1:

The purge gas flow is segmented into multiple directed paths by the multiple baffles. Each baffle creates a localized flow pattern that targets specific areas, ensuring effective porogen removal without requiring excessive overall gas flow, thus reducing gas consumption while maintaining cleaning effectiveness.

Inventive Principle:

Principle #1Segmentation

3Productivity

If cleaning gas flow path is restricted by baffles, then purge gas flow characteristics are maintained, but cleaning gas species path is blocked

Engineering Contradiction:

Improvebatch processing capabilityVSAvoidcleaning gas delivery

Core Design Contradiction:

ProductivityVSReliability

Solution Approach 1:

The cleaning system is segmented into multiple gas delivery paths, each associated with specific baffles. This allows purge gas to flow through certain baffle configurations while cleaning gas can be delivered through other paths, ensuring both functions operate effectively without mutual interference.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The multiple baffles act as intermediaries that selectively guide different gas types through appropriate paths. The baffles are positioned and configured to allow purge gas to maintain its flow characteristics while providing separate access paths for cleaning gas species to reach the window and chamber surfaces.

Inventive Principle:

Principle #24Intermediary (Mediator)

4Ease of manufacture

If a single baffle design is used, then manufacturing is simple, but cleaning thoroughness is insufficient

Engineering Contradiction:

Improvebaffle fabricationVSAvoidchamber cleaning thoroughness

Core Design Contradiction:

Ease of manufactureVSReliability

Solution Approach 1:

The cleaning function is segmented across multiple baffles positioned at different locations. Each individual baffle remains simple to manufacture, but their collective arrangement provides comprehensive chamber coverage, ensuring thorough cleaning of all surfaces including areas that would be inaccessible to a single baffle.

Inventive Principle:

Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This design enhances the cleaning efficiency of photonic temperature processing systems by reducing porogen accumulation, allowing for larger batches between cleans, shorter clean times, and more thorough chamber cleaning, thereby improving system throughput.

Implementation Method 1

A purge ring with separate baffles for delivering purge gas and remote plasma cleaning gas to a chamber

Methodology Applied

Scientific EffectGas flow:

Implementation Method 2

separate paths for purge and cleaning gases, allowing for reduced recombination of remote plasma cleaning species

Methodology Applied

Scientific EffectRemote plasma cleaning: Plasma

Data Source

PatentUS8883406B2Method for using a purge ring with split baffles in photonic thermal processing systems

Publication Date: 2014.11.11 NOVELLUS SYSTEMS INC

AI summary

A method for supplying a first gas and a second gas using a purge ring in a photonic processing system includes arranging a first layer and a second layer to define a first plenum and a first baffle, arranging the second layer and a third layer to define a second plenum and a second baffle, receiving a first gas at the first plenum that flows through the first plenum and the first baffle to an inner region, and receiving a second gas at the second plenum that flows through the second plenum and the second baffle to the inner region. The second baffle is one of less restrictive and more restrictive than the first baffle.