Split Mask Assembly for Large-Area Deposition

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Solution Overview

Problem

Existing mask frame assemblies face challenges in accommodating large-surface deposition patterns for organic light-emitting display devices without increasing etching errors, as traditional split masks become too wide and prone to errors when exceeding a certain size.

Innovation Solution

A mask frame assembly comprising a frame with multiple split masks, where each split mask is formed by coupling partial masks with uniform pattern pitches and bonded using UV-curing or thermosetting adhesives, allowing for the creation of large-surface deposition patterns without increasing etching errors.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Area of stationary object

If the split mask width is increased to accommodate larger deposition patterns, then the deposition area coverage is improved, but the etching precision deteriorates

Engineering Contradiction:
Improvedeposition area coverageVSAvoidetching precision
Core Design Contradiction:
Area of stationary objectVSManufacturing precision

Solution Approach 1:

The patent divides a large deposition pattern into multiple unit patterns, each covered by a separate split mask. Instead of using one large mask that would cause etching errors, multiple smaller masks are arranged to collectively cover the entire deposition area, maintaining etching precision while achieving large-area coverage.

Inventive Principle:
Principle #1Segmentation

2Area of stationary object

If multiple partial masks are coupled to form a large split mask, then the deposition pattern coverage is improved, but the mask assembly complexity increases

Engineering Contradiction:
Improvedeposition pattern coverageVSAvoidmask assembly complexity
Core Design Contradiction:
Area of stationary objectVSDevice complexity

Solution Approach 1:

The mask system is segmented into multiple independent partial masks that can be manufactured separately and then coupled together. This segmentation allows for simplified manufacturing of each individual mask while achieving large-area coverage through assembly, balancing complexity and coverage requirements.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Multiple partial masks are merged or coupled together to form a complete mask assembly that covers the entire deposition pattern. The coupling mechanism integrates separate simple components into a functional whole, achieving large coverage without the complexity of manufacturing a single large mask.

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables the easy manufacturing of split masks for large-surface screens with reduced etching errors by forming split masks from multiple partial masks with uniform pattern pitches, effectively accommodating larger deposition patterns without increasing etching errors.

Implementation Method 1

The adhesive may be a UV-curing adhesive. The UV-curing adhesive may be coated on upper and lower surfaces of the bonding portion and cured.

Methodology Applied
Scientific EffectUV-curing: Photopolymerisation

Implementation Method 2

The adhesive may be a thermosetting adhesive. The thermosetting adhesive may be coated on sides of the bonding portion and cured.

Methodology Applied
Scientific EffectThermosetting:

Data Source

PatentUS8869738B2Mask frame assembly for thin film deposition and the manufacturing method thereof
Publication Date: 2014.10.28 SAMSUNG DISPLAY CO LTD
  • US8869738B2 patent drawing
  • US8869738B2 patent drawing
  • US8869738B2 patent drawing

AI summary

A mask frame assembly using a plurality of stick-shaped split masks. The mask frame assembly includes a plurality of split masks, each of which includes a deposition pattern corresponding to a unit screen. Each of the split masks is formed of a plurality of partial masks to form the deposition pattern corresponding to a unit screen. Accordingly, the split masks accommodating a pattern corresponding to a large screen may be easily manufactured without an increase in the amount of etching errors.