SPPW Fine Patterning with Micro Lens Arrays for Nano-Scale Resolution
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Solution Overview
Problem
Conventional methods struggle to fabricate high-aspect-ratio, high-resolution fine patterns at the nano-scale level, limiting the performance enhancement of devices in fields such as bio-sensors, gas sensors, and functional films.
Innovation Solution
An apparatus combining lens technology with a self-propagating photopolymer waveguide (SPPW) process, utilizing a micro lens array (MLA) and digital optical technology, including a digital light processor (DLP), to control the irradiation pattern of light and cure photo-curable resin into high-aspect-ratio, high-resolution fine patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional photolithography and etching processes are used, then fine patterns can be fabricated at the micro-scale level, but it is very difficult to fabricate them at the nano-scale level
Solution Approach 1:
The patent replaces conventional mechanical photolithography and etching processes with a self-propagating photopolymer waveguide (SPPW) process. Light is irradiated through a transparent substrate into photo-curable resin, creating a self-propagating polymerization wave that forms high-aspect-ratio nano-scale patterns without requiring complex mechanical etching steps
Solution Approach 2:
The patent changes the fundamental processing parameters by using optical fields instead of mechanical fields. By controlling light intensity, wavelength, and irradiation patterns, the system achieves nano-scale resolution that is difficult to obtain with conventional micro-scale photolithography
2Area of stationary object
If a micro lens array (MLA) is applied to the SPPW process, then nano-scale fine patterns can be smoothly fabricated on a large-area substrate, but the device complexity increases
Solution Approach 1:
The patent divides the optical system into multiple micro-lens elements arranged in an array. Each micro-lens focuses light to a specific point on the substrate, enabling parallel fabrication of multiple nano-scale patterns across large areas. This segmentation approach simplifies the overall system compared to using a single complex optical element
Solution Approach 2:
The micro lens array serves multiple functions simultaneously: it focuses light, defines pattern geometry, and enables large-area coverage. The same MLA structure can be used for different pattern types by simply changing the irradiation sequence, providing universal applicability without increasing device complexity
3Adaptability or versatility
If digital optical technology is combined with the SPPW process, then various types of fine patterns can be fabricated, but the device complexity increases
Solution Approach 1:
The patent employs dynamic control of the digital light processor to switch between different irradiation patterns. By programmatically controlling which regions receive light and when, the system can fabricate various pattern types (lines, dots, complex geometries) without physical reconfiguration, achieving versatility through dynamic optical modulation
Solution Approach 2:
The digital light processor creates optical copies of desired patterns by modulating light intensity across different spatial regions. Digital pattern data is transformed into corresponding light intensity distributions, allowing rapid replication of various pattern types without changing the physical optical hardware
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the fabrication of nano-scale fine patterns on a large-area substrate with high resolution and versatility, allowing for various pattern types and efficient production of high-aspect-ratio structures.
Implementation Method 1
a lens member disposed between the light source and the transparent substrate and configured to focus light from the light source onto the other surface of the transparent substrate
Implementation Method 2
a photo-curable resin applied on one surface of the transparent substrate and curable by light
Implementation Method 3
configured to focus light from the light source onto the other surface of the transparent substrate to cure the photo-curable resin into a high-aspect-ratio, high-resolution fine pattern according to a self-propagating polymer waveguide (SPPW) process
Data Source
Figure 1
Figure 2(a)~2(c)
Figure 3
AI summary
An apparatus for manufacturing a high-aspect-ratio, high-resolution fine pattern according to an embodiment of the present invention may comprise: a transparent substrate; a photocurable resin applied to one side of the transparent substrate and cured by light; a light source providing light to the other side of the transparent substrate to cure the photocurable resin; and a lens member which is disposed between the light source and the transparent substrate and focuses the light from the light source onto the other side of the transparent substrate to cure the photocurable resin into a high-aspect-ratio, high-resolution fine pattern according to a self-propagating polymer waveguide (SPPW) process.