Spray Electrode Interconnects for Semiconductor Parasitic Reduction

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Solution Overview

Problem

Conventional wire bonding techniques for connecting power semiconductor devices to substrates or packages result in high parasitic inductance and resistance, limiting the frequency characteristics of high-power/high-frequency semiconductor devices due to inherent electrical parasitic inductance and resistance.

Innovation Solution

A semiconductor device with a substrate, source trace, drain trace, and gate trace, where insulating films cover the transistor, and source and gate spray electrodes connect the transistor pads to the traces, reducing parasitic inductance and resistance by replacing traditional wire bonding with a wider, more rectangular cross-sectional area interconnection structure.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If wire bonding technique is used to connect power semiconductor devices to substrates or packages, then electrical connection is achieved, but parasitic inductance and resistance increase, limiting frequency characteristics

Engineering Contradiction:
Improvefrequency characteristicsVSAvoidparasitic inductance and resistance
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The patent extracts and eliminates the bonding wire from the connection structure, replacing it with a direct spray electrode-to-pad connection. This removes the source of parasitic inductance and resistance, achieving lower electrical parasitics while maintaining reliable electrical connection for high-frequency operation

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent transitions from a thin-wire connection (one-dimensional) to a wide-area spray electrode connection (two-dimensional). The spray electrode has a wider and more rectangular cross-sectional area, fundamentally changing the connection geometry to reduce parasitic effects and improve frequency characteristics

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Object-generated harmful factors

If bonding wire is used for connection, then electrical connection is established, but the cross-sectional area is limited, resulting in higher parasitic inductance and resistance

Engineering Contradiction:
Improveparasitic inductance and resistanceVSAvoidcross-sectional area of connection
Core Design Contradiction:
Object-generated harmful factorsVSArea of moving object

Solution Approach 1:

The patent changes the geometric parameters of the connection structure by replacing a thin wire with a wide-area spray electrode. The spray electrode has a wider and more rectangular cross-sectional area, which directly reduces parasitic inductance and resistance while improving electrical connection performance

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution significantly reduces parasitic inductance and resistance, enhancing high-frequency switching performance of semiconductor devices.

Implementation Method 1

a spray technique is known as a technique to form copper (Cu) coating having a larger area than that of bonding wire

Methodology Applied
Scientific EffectSpray deposition: Spray

Data Source

PatentUS8410600B2Semiconductor device with protecting film and method of fabricating the semiconductor device with protecting film
Publication Date: 2013.04.02 WOLFSPEED INC
  • US8410600B2 patent drawing
  • US8410600B2 patent drawing
  • US8410600B2 patent drawing

AI summary

Provided are a semiconductor device and a method of fabricating the semiconductor device, the semiconductor device including: a source trace, a drain trace, and a gate trace placed on a substrate; a transistor which is placed on the drain trace and includes a source pad and a gate pad; insulating films placed between the drain and source traces and between the drain and gate traces on the substrate so as to cover sidewall surfaces of the transistor; a source spray electrode which is placed on the insulating film between the source and drain traces and connects the source pad of the transistor and the source trace; and a gate spray electrode placed on the insulating film between the gate and drain traces and connects the gate pad of the transistor and the gate trace.