Spring-like Conductive Member for Edge Ring Stability
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Solution Overview
Problem
The wear of the edge ring in plasma processing apparatuses leads to uneven etching rates and tilting due to changes in the ion irradiation angle, resulting in reduced productivity due to frequent replacements.
Innovation Solution
A spring-like conductive member is used to stabilize the contact between the edge ring and the mounting stage, ensuring they have the same potential, allowing for precise control of the sheath thickness and maintaining uniform etching rates by applying direct voltage from a variable direct current power source.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the edge ring is replaced frequently to maintain etching uniformity, then the etching quality is improved, but the productivity deteriorates due to replacement time
Solution Approach 1:
The edge ring is designed to self-adjust its position through the spring-like conductive member that applies constant pressure. This self-service mechanism compensates for wear automatically without requiring manual intervention or replacement, maintaining etching uniformity while eliminating replacement time and improving productivity
Solution Approach 2:
The invention changes the physical state of the contact between edge ring and mounting stage by introducing a spring-like conductive member that applies constant pressure. This parameter change (from fixed to dynamic pressure) allows the edge ring to maintain optimal positioning despite wear, resolving the contradiction between maintaining precision and improving productivity
2Productivity
If the edge ring is used for extended periods to improve productivity, then the productivity is improved, but the etching uniformity deteriorates due to wear
Solution Approach 1:
The edge ring contact mechanism is changed from static (fixed position) to dynamic (spring-like with constant pressure). This allows the edge ring to adapt its position continuously during extended use, maintaining etching uniformity while enabling longer operational periods and improved productivity
Solution Approach 2:
The spring-like conductive member applies constant pressure in advance to pre-position the edge ring optimally. This preliminary action compensates for wear before it significantly impacts etching uniformity, allowing extended use while maintaining quality and improving productivity
3Device complexity
If a fixed contact structure is used between edge ring and mounting stage, then the device complexity is reduced, but the control precision of sheath thickness deteriorates
Solution Approach 1:
A spring-like conductive member is introduced as an intermediary between the edge ring and mounting stage. This intermediary component provides continuous pressure to maintain optimal contact and sheath thickness control without requiring complex active control systems, achieving precision while keeping the structure relatively simple
Solution Approach 2:
The spring-like conductive member automatically adjusts and maintains constant pressure between the edge ring and mounting stage without external control. This self-service mechanism ensures precise sheath thickness control while avoiding the need for complex control systems, resolving the contradiction between simplicity and precision
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enhances the uniformity of the in-plane etching rate distribution, reduces tilting, and delays the need for edge ring replacement, thereby improving productivity.
Implementation Method 1
a spring-like conductive member that includes a first spring-like member contacting the edge ring at a first recess formed in the edge ring, and a second spring-like member contacting the mounting stage at a second recess formed in the mounting stage
Implementation Method 2
it is proposed that a direct voltage output from a direct current power source is applied to the edge ring to control the thickness of the sheath of the edge ring
Data Source
AI summary
A mounting apparatus for an object to be processed includes a mounting stage, on which an object to be processed is mounted inside a processing container, an edge ring disposed in a peripheral edge portion of the mounting stage, and a spring-like conductive member that includes a first spring-like member contacting the edge ring at a first recess formed in the edge ring, and a second spring-like member contacting the mounting stage at a second recess formed in the mounting stage.


