Spring-Loaded Sealing System for Reactor Susceptor Fluid Separation
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Solution Overview
Problem
In semiconductor processing reactor systems, contaminants often transfer from the upper to the lower chamber due to inadequate sealing between the two volumes, leading to contamination and purity issues during processes like deposition and etching.
Innovation Solution
A sealing system comprising a spacer plate, a spring, and a flow control ring is used, where the spring is biased to create a partial seal between the susceptor and the spacer plate, and between the flow control ring and the susceptor, allowing for adjustable separation of the reaction space and lower chamber space, even as the susceptor moves within the reactor.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a rigid seal is used between the upper and lower chambers, then sealing effectiveness is improved, but adaptability to susceptor movement and temperature variations deteriorates
Solution Approach 1:
The patent employs a flexible sealing member comprising an O-ring and a lip seal that can deform and adapt to the movement of the susceptor. The O-ring is installed in a groove on the susceptor, and the lip seal is positioned between the susceptor and the spacer plate, both providing flexible sealing that accommodates thermal expansion and mechanical movement while maintaining contamination barrier effectiveness.
Solution Approach 2:
The sealing system is designed to be dynamic rather than static. The flexible sealing members can move and deform with the susceptor during thermal cycling and mechanical operation. The spring-loaded flow control ring also provides dynamic sealing pressure that adjusts to maintain contact between sealing surfaces despite relative movement between components.
2Manufacturing precision
If the reaction space height is fixed, then manufacturing precision is improved, but adaptability to different processing conditions deteriorates
Solution Approach 1:
The patent implements an adjustable reaction space height through the movable susceptor mechanism. The susceptor can be positioned at different heights within the reaction chamber, allowing the reaction space to be adjusted for different processing conditions. The flexible sealing system maintains effective sealing across the range of motion, enabling dynamic adjustment while preserving manufacturing precision through controlled positioning.
Solution Approach 2:
The sealing system is designed to serve multiple functions: it provides contamination sealing, accommodates thermal expansion, allows for height adjustment, and maintains sealing during susceptor movement. This multi-functional design enables the same sealing mechanism to support both fixed precision requirements and variable processing conditions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively maintains a partial fluid separation between the reaction space and the lower chamber space, reducing contamination and allowing for adjustable reaction space height during processing, while being durable enough to withstand high temperatures and manufacturing variations.
Implementation Method 1
a spring coupled to the spacer plate and the susceptor having a spring bias toward a compressed position or an extended position, such that the spring bias facilitates creation of at least a partial seal between the spacer plate and the susceptor
Data Source
AI summary
A reaction chamber may comprise a reaction chamber volume enclosed within the reaction chamber; a susceptor configured to support a substrate disposed in the reaction chamber volume; a reaction space above the susceptor, and a lower chamber space below the susceptor, within the reaction chamber volume; and/or a sealing system causing the reaction space and the lower chamber space to be at least partially fluidly separate. A sealing system may comprise a spacer plate surrounding and coupled to the susceptor; and/or a spring coupled to the spacer plate and the susceptor having a spring bias toward a compressed position or an extended position, such that the spring bias facilitates creation of at least a partial seal between the spacer plate and the susceptor, causing at least partial fluid separation between the reaction space and the lower chamber space as the susceptor moves up and down within the reaction chamber.