Adjustable Sputter Target Magnet for Uniform Target Consumption
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Solution Overview
Problem
Existing Physical Vapor Deposition (PVD) systems face inefficiencies in target material utilization, leading to significant waste due to uneven magnetic field distribution, resulting in non-uniform target consumption and premature replacement.
Innovation Solution
Adjustable magnets are used to modify the magnetic field distribution within the deposition chamber, optimizing the magnetic field to achieve a more uniform target consumption profile, reducing waste and improving target efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of substance
If conventional fixed magnetic field distribution is used in PVD deposition chamber, then deposition process is simple, but target material utilization is inefficient leading to significant waste
Solution Approach 1:
The magnetic field distribution is segmented into multiple independent adjustable magnets rather than using a single fixed magnetic field source. Each magnet can be independently adjusted to optimize the magnetic field distribution across different regions of the target, thereby improving target material utilization and reducing waste.
Solution Approach 2:
The magnetic field distribution is made dynamic and adjustable through the use of multiple magnets with variable positions and strengths. This allows the system to adapt the magnetic field configuration to optimize target consumption patterns, transforming from a static fixed field to a dynamic可调 field that can be optimized for different deposition scenarios.
2Manufacturing precision
If adjustable magnets are used to optimize magnetic field distribution, then target consumption uniformity is improved, but device complexity increases
Solution Approach 1:
Different regions of the target receive locally optimized magnetic field strengths through the adjustable magnets. This allows precise control over the magnetic field distribution to achieve uniform target consumption across the target surface, addressing local variations in deposition patterns.
Solution Approach 2:
The magnetic field parameters (strength and position) are made adjustable to optimize target consumption uniformity. By changing these parameters, the system can achieve better manufacturing precision in terms of uniform target wear, while the adjustability itself becomes part of the controlled complexity.
3Productivity
If magnetic field distribution is modified to extend target lifespan, then target efficiency increases, but control precision requirements increase
Solution Approach 1:
The system incorporates feedback mechanisms to monitor and adjust the magnetic field distribution, ensuring precise control over target consumption patterns. This feedback control allows the system to maintain optimal magnetic field parameters that extend target lifespan while compensating for variations in the deposition process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The modified magnetic field distribution leads to a more efficient utilization of target materials, extending their lifespan by up to 50% and reducing waste, while maintaining deposition quality.
Implementation Method 1
a magnet, disposed above the target and spaced apart from the target, the magnet having a north pole and a south pole
Implementation Method 2
magnetron, located on the top of the chamber, the magnetron including a magnet array
Data Source
AI summary
A method for modifying magnetic field distribution in a deposition chamber is disclosed. The method includes the operations of providing a target magnetic field distribution, removing a first plurality of fixed magnets in the deposition chamber, replacing each of the first plurality of fixed magnets with respective ones of a second plurality of magnets, performing at least one of adjusting a position of at least one of the second plurality of the magnets, and adjusting a size of at least one of the second plurality of magnets, adjusting a magnetic flux of at least one of the second plurality of magnets, measuring the magnetic field distribution in the deposition chamber, and comparing the measured magnetic field distribution in the deposition chamber with the target magnetic field distribution.