Adjustable Sputtering Magnet Bearing for Target Wear Compensation
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Solution Overview
Problem
The existing magnet systems in sputtering devices face challenges due to deflection issues, which affect the homogeneity of the magnetic field and subsequently the deposited layer on substrates, as the separation between the magnet system and the target changes with the consumption of target material, leading to variations in magnetic field strength and layer quality.
Innovation Solution
A magnet system is designed with adjustable components, including a bearing device that allows for translational degrees of freedom, enabling the adjustment of the magnet system's position relative to the target to match the deflection of the target, thereby maintaining consistent magnetic field strength and layer homogeneity throughout the target's consumption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If the magnet system is fixed in position, then the device complexity is reduced, but the magnetic field homogeneity deteriorates as the target is consumed
Solution Approach 1:
The magnet system is designed with adjustable components including a bearing device that allows translational degrees of freedom. This enables the magnet system to dynamically adjust its position relative to the target as the target is consumed, maintaining consistent magnetic field strength and layer homogeneity throughout the sputtering process.
2Reliability
If the separation between magnet system and target is kept constant, then the magnetic field strength remains stable, but the target consumption cannot be compensated
Solution Approach 1:
The adjustable bearing device allows the magnet system to move translationally, adapting the separation distance between the magnet system and target as the target is consumed. This dynamic adjustment maintains process stability while compensating for target wear.
3Manufacturing precision
If the magnet system is made adjustable to compensate for target consumption, then the layer homogeneity is improved, but the device complexity increases
Solution Approach 1:
The magnet system incorporates an adjustable bearing device with translational degrees of freedom that allows controlled movement to maintain optimal magnet-to-target separation. This dynamic capability ensures layer homogeneity while managing structural complexity through purposeful adjustability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution ensures improved process stability and reproducibility by maintaining a consistent magnetic field distribution, enhancing the homogeneity of the deposited layers and reducing the impact of target material consumption on the sputtering process.
Implementation Method 1
the formation of the plasma may be supported by means of a magnetic field. To generate the magnetic field, a magnet system may be or be arranged on the target material or on the cathode
Implementation Method 2
a plasma-forming gas may be ionized by means of a cathode, and a material to be deposited (target material) may be sputtered by means of the plasma formed in the process
Implementation Method 3
the atomized target material may then be brought to a substrate on which it may be deposited and form a layer
Data Source
AI summary
Disclosed herein are systems, methods, and devices related to a magnet system for a sputtering device. The magnet system includes a bearing frame and a magnet holder having a first mounting area and a second mounting area. The magnet system has a first support device mounted to the magnet holder by the first mounting area and a second support device mounted to the magnet holder by the second mounting area. At least one of the first mounting area and the second mounting area are configured such that a position in which the first support device and the second support device are mounted to the magnet holder relative to each other may be adjusted. The first support device and the second support device are configured to engage with the bearing frame to form a bearing device for supporting the magnet holder.