Sputtering Device Outer Mask for Multilayer Optical Recording
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The fabrication of multilayer optical recording media using conventional sputtering devices often results in defects in the recording region due to thermal expansion of the substrate causing scratches and curling of intermediate layers, which affects the adhesion and pattern transfer of ultraviolet curing resin and stamper relief patterns.
Innovation Solution
A sputtering device configuration where the outer mask covers the outer periphery of the film-forming surface without contact, and the inner mask covers the inner periphery while pressing convex portions without contact, preventing scratches and curling by maintaining a distance from the film-forming surface, thereby suppressing defect occurrence.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the outer mask covers the outer periphery of the film-forming surface during sputtering, then the adhesion and pattern transfer are improved, but the substrate thermal expansion causes scratches and curling of the intermediate layer
Solution Approach 1:
The mask is divided into multiple segments: an outer mask for covering the outer periphery, an inner mask for covering the inner periphery, and a bridge portion connecting them. This segmentation allows each part to perform its specific function while reducing the overall harmful effects of thermal expansion on pattern transfer precision.
Solution Approach 2:
The bridge portion acts as an intermediary element connecting the outer mask and inner mask. It provides structural support and maintains the relative positions of the masks during sputtering, mediating the effects of substrate thermal expansion to prevent scratches and curling while ensuring accurate pattern transfer.
2Manufacturing precision
If the mask covers the film-forming surface to improve adhesion, then the pattern transfer is enhanced, but defects occur in the recording region due to contact with the film-forming surface
Solution Approach 1:
The mask structure is designed with different local qualities: the outer mask and inner mask have different shapes and positions relative to the film-forming surface, allowing each region to provide appropriate coverage without causing defects. The bridge portion connects these regions with specific structural properties that prevent harmful contact while maintaining adhesion in critical areas.
3Productivity
If conventional sputtering devices are used for multilayer optical recording media, then the storage capacity is increased through multilayering, but defects in the recording region reduce storage reliability
Solution Approach 1:
The mask is segmented into outer mask, inner mask, and bridge portion, allowing precise control over different regions of the film-forming surface during sputtering. This segmentation enables the formation of multiple layers with high storage capacity while preventing defects that would compromise storage reliability.
Solution Approach 2:
The bridge portion serves as an intermediary structure that connects the outer and inner masks, providing structural stability during the sputtering process. This intermediary element ensures consistent mask positioning across multiple layers, maintaining both high storage capacity and storage reliability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively reduces defects in the multilayer optical recording medium by preventing scratches and curling, ensuring improved adhesion and pattern transfer, leading to enhanced storage reliability and increased storage capacity.
Implementation Method 1
forming an inorganic layer on the film-forming surface of an intermediate layer by sputtering
Data Source
AI summary
Provided is a sputtering device for a multilayer optical recording medium capable of suppressing the occurrence of defects in a recording region. A sputtering device for a multilayer optical recording medium includes an outer mask, wherein the outer mask is configured to be capable of covering an outer periphery of a film-forming surface of an intermediate layer without coming into contact with the film-forming surface.