Sputtering Target Bonding for Peel-Resistant Large Targets

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Solution Overview

Problem

The conventional method of bonding a sputtering target is insufficient, leading to a low bonding rate and large maximum defect areas, resulting in the target material peeling off during sputtering.

Innovation Solution

An improved method of bonding a sputtering target involves applying a bonding material to a backing plate, sliding the target material to cover the bonding region, and reversing it to ensure complete coverage, resulting in a bonding rate of 97% or more and a maximum defect area of 0.6% or less.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the conventional bonding method is used, then the bonding process can be completed, but the bonding rate is low and the maximum defect area is large

Engineering Contradiction:
Improvebonding rateVSAvoidtarget material peeling resistance
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The bonding material is applied to the backing plate before the target material is placed, and the target material is then slid across the bonding region to distribute the bonding material uniformly. This preliminary preparation ensures complete coverage and eliminates gaps that would cause defects and peeling during sputtering.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

Instead of statically placing the target material, the invention employs a dynamic sliding motion where the target material is moved across the bonding region. This dynamic approach ensures uniform distribution of bonding material and complete coverage, achieving a bonding rate of 97% or more while reducing maximum defect area to 0.6% or less.

Inventive Principle:
Principle #15Dynamics

2Manufacturing precision

If the target material is slid only in one direction, then the bonding process is simple, but the coverage is incomplete and defects remain

Engineering Contradiction:
Improvebonding area coverageVSAvoidbonding process complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The bonding process is segmented into two distinct sliding phases: a first sliding process in one direction and a second sliding process in the opposite direction. This segmentation ensures that the bonding material is distributed uniformly across the entire bonding region, achieving complete coverage with a bonding rate of 97% or more while keeping each individual sliding action simple.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method significantly improves the bonding rate and reduces the maximum defect area, preventing the target material from peeling off during sputtering, even for large or elongated targets.

Implementation Method 1

the target material and the backing plate are relatively moved and overlapped while being rubbed with each other

Methodology Applied
Scientific EffectFriction: Friction

Implementation Method 2

a target material and a backing plate with a bonding material, wherein the target material is bonded via the bonding material to a bonding region of the backing plate

Methodology Applied
Scientific EffectAdhesion: Adhesive

Data Source

PatentUS20250125131A1Sputtering target, method of bonding target material and backing plate, and method of manufacturing sputtering target
Publication Date: 2025.04.17 SUMITOMO CHEM CO LTD
  • US20250125131A1 patent drawing
  • US20250125131A1 patent drawing
  • US20250125131A1 patent drawing

AI summary

A sputtering target comprising:a backing plate; anda target material bonded via a bonding material to a bonding region of the backing plate, whereina bonding area of a bonding portion between the target material and the backing plate accounts for 97% or more of the area of the bonding region, and whereina maximum defect area of portions without the bonding material present between the target material and the backing plate accounts for 0.6% or less of the area of the bonding region.The sputtering target enables manufacturing of the sputtering target in which the target material is hardly peeled off during sputtering.