Sputtering Target for Metallic Glass Membranes
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Solution Overview
Problem
Conventional methods for manufacturing metallic glass membranes, such as quenching of molten metal, result in defects, uneven composition, high costs, and limitations in achieving thin membranes due to segregation and crystallite growth, which affect sputtering characteristics and membrane quality.
Innovation Solution
A sputtering target comprising sintered atomized powder with a ternary compound system of Pd, Zr, Fe, Co, Cu, and Ni as main components, with an average grain size of 50 μm or less and crystallite size of 10Å to 200Å, ensuring a uniform and amorphous structure to prevent segregation and particle generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional quenching methods are used to manufacture metallic glass membranes, then the manufacturing cost is high and the process is complex, but the membrane thickness is limited to 30 μm or more and defects occur
Solution Approach 1:
The patent replaces the conventional mechanical quenching system with a sputtering deposition system. Instead of melting and rapidly cooling metal to form glass, the invention uses physical vapor deposition to directly form amorphous metallic glass membranes on substrates, eliminating the need for complex quenching apparatus while achieving superior membrane uniformity and thinner thickness
Solution Approach 2:
The invention changes the fundamental manufacturing parameters from high-temperature melting and rapid cooling to low-temperature sputtering deposition. By controlling deposition conditions such as sputtering power, gas pressure, and substrate temperature, the process achieves amorphous structure formation without requiring complex quenching mechanisms
2Ease of manufacture
If sputtering is performed using conventional targets, then the process is simpler, but nodules and particles are generated due to segregation and crystallite growth
Solution Approach 1:
The invention performs preliminary action by pre-forming amorphous metallic glass targets with controlled composition and structure before sputtering. The targets are manufactured with specific element distributions and amorphous phases that prevent segregation and particle formation during the actual sputtering process, ensuring high membrane quality
Solution Approach 2:
The invention uses composite target materials with specific multi-element compositions designed to maintain amorphous structure during sputtering. The composite nature of the targets, with carefully selected element combinations, prevents crystallization and segregation that would otherwise lead to nodule and particle generation
3Stability of the object's composition
If amorphous structure is achieved through quenching, then uniform composition is obtained, but the manufacturing cost increases extremely
Solution Approach 1:
The patent replaces expensive quenching equipment and processes with more economical sputtering deposition systems. By using physically vapor-deposited targets rather than melt-quenched materials, the invention achieves comparable or superior composition uniformity at significantly lower manufacturing cost
Solution Approach 2:
The invention creates a copy of the desired amorphous metallic glass structure through sputtering deposition onto substrates. Rather than forming bulk amorphous material through expensive quenching, the process deposits thin-film copies with controlled composition and amorphous structure, reducing material and processing costs
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The approach yields a high-density, uniform sputtering target that produces smooth, defect-free metallic glass membranes with enhanced evenness and reduced particle generation, allowing for thinner and larger membranes to be manufactured at lower costs, improving sputtering deposition quality.
Implementation Method 1
a sputtering target for producing a metallic glass membrane
Implementation Method 2
comprising a structure obtained by sintering atomized powder
Data Source
AI summary
A sputtering target for producing a metallic glass membrane characterized in comprising a structure obtained by sintering atomized powder having a composition of a ternary compound system or greater with at least one or more metal elements selected from Pd, Zr, Fe, Co, Cu and Ni as its main component (component of greatest atomic %), and being an average grain size of 50 μm or less. The prepared metallic glass membrane can be used as a substitute for conventional high-cost bulk metallic glass obtained by quenching of molten metal. This sputtering target for producing the metallic glass membrane is also free from problems such as defects in the metallic glass membrane and unevenness of composition, has a uniform structure, can be produced efficiently and at low cost, and does not generate many nodules or particles. Further provided is a method for manufacturing such a sputtering target for forming the metallic glass membrane.