Sputtering Target Spacer Prevents Ceramic Ring Scratching
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Solution Overview
Problem
Current sputtering plasma reactors experience direct contact between the target and insulating ring, leading to visible scratches and black markings on the target during the sputtering process, necessitating frequent reconditioning.
Innovation Solution
Incorporating a low coefficient of friction spacer between the target and insulating ring to maintain a gap, preventing direct contact and thereby reducing scratching and black marking, with embodiments using pressure pads, annular rings, or adhesive coatings.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the target makes direct contact with the insulating ring, then the structural support and electrical insulation are ensured, but the target surface suffers from scratches and black markings requiring frequent reconditioning
Solution Approach 1:
A spacer made of low-coefficient of friction material (such as PTFE or Delrin) is introduced as an intermediary component between the target and the insulating ring. This spacer prevents direct contact between the target surface and the insulating ring, thereby eliminating the harmful friction and marking effects while still maintaining the necessary mechanical support and electrical insulation functions through the spacer itself.
2Object-affected harmful factors
If a spacer is introduced between the target and insulating ring, then scratching and black marking are prevented, but the device complexity increases
Solution Approach 1:
The spacer is designed as a consumable component with a service life matched to the target. When the target reaches the end of its operational life (indicated by sputter deposition thickness), the spacer is also replaced. This approach simplifies maintenance by bundling the replacement of both components together, reducing the overall maintenance complexity despite adding the spacer component.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The spacer effectively inhibits scratching and black marking, reducing the need for frequent target reconditioning and ensuring a stable sputtering process by maintaining a gap between the target and insulating ring.
Implementation Method 1
The spacer is made of a suitable low coefficient of friction material and inhibits black marking, scratching or the like that may otherwise occur along the interface between the ceramic ring and the target
Implementation Method 2
A first O-ring establishes a vacuum seal between the target and the insulating ring while a second O-ring maintains the vacuum seal between the insulating ring and an adapter ring of the PVD chamber wall
Implementation Method 3
The electrical bias causes the argon to discharge and form a plasma of positively charged argon ions and negatively charged electrons in the space between the target and the substrate
Implementation Method 4
The argon ions are electrically attracted to the negatively charged target and, strike it at high enough energy to sputter target particles from the target
Implementation Method 5
The sputtered material travels ballistically, generally omni-directionally, and some fraction hit the substrate to be deposited thereon as a thin film
Data Source
AI summary
A sputtering plasma reactors for plasma vapor deposition (PVD) having an improved interface between a PVD target, a ceramic ring and a PVD chamber wall. The reactor includes a PVD chamber wall and a PVD target, wherein the target in conjunction with the PVD chamber wall form a vacuum chamber and wherein at least the portion of the target facing the vacuum chamber is composed of material to be sputtered. The reactor also includes an insulating ceramic ring positioned between the target and the PVD chamber wall. A first O-ring is provided to establish a vacuum seal between the target and the insulating ring and a second O-ring is provided to establish a vacuum seal between the insulating ring and the PVD chamber wall. At least one spacer is positioned between the target and insulating ring to maintain a gap G between the insulating ring and the target. The spacer is made of a suitable low coefficient of friction material and inhibits black marking, scratching or the like that may otherwise occur along the interface between the ceramic ring and the target.